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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
09/11/2018
Application #:
15241274
Filing Dt:
08/19/2016
Publication #:
Pub Dt:
02/23/2017
Inventors:
Hisashi NAKAGAWA, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima et al
Title:
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
Assignment: 1
Reel/Frame:
041151/0797Recorded: 02/02/2017Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
09/09/2016
Exec Dt:
09/09/2016
Exec Dt:
09/14/2016
Exec Dt:
01/20/2017
Exec Dt:
01/20/2017
Exec Dt:
09/21/2016
Assignees:
1-1, YAMADAOKA
SUITA-SHI, OSAKA, JAPAN
3-1 AKASAKA 5-CHOME, MINATO-KU
TOKYO, JAPAN 107-6325
Correspondent:
OBLON, ET AL.
1940 DUKE STREET
ALEXANDRIA, VA 22314
Assignment: 2
Reel/Frame:
043820/0870Recorded: 09/12/2017Pages: 4
Conveyance:
ASSIGNMENT OF PARTIAL RIGHTS
Assignors:
Exec Dt:
09/01/2017
Exec Dt:
09/01/2017
Assignee:
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU
TOKYO, JAPAN
Correspondent:
OBLON, ET AL.
1940 DUKE STREET
ALEXANDRIA, VA 22314

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