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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
NONE
Issue Dt:
Application #:
15611039
Filing Dt:
06/01/2017
Publication #:
20170269476
Pub Dt:
09/21/2017
Inventors:
Hisashi NAKAGAWA, Motohiro SHIRATANI, Takehiko NARUOKA, Tomoki NAGAI
Title:
PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD
Assignment: 1
Reel/Frame:
042566/0601Recorded: 06/01/2017Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
NAKAGAWA, HISASHI
Exec Dt:
05/26/2017
SHIRATANI, MOTOHIRO
Exec Dt:
05/26/2017
NARUOKA, TAKEHIKO
Exec Dt:
05/31/2017
NAGAI, TOMOKI
Exec Dt:
05/31/2017
Assignee:
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU
TOKYO, JAPAN
Correspondent:
OBLON, MCCLELLAND, MAIER & NEUSTADT, LLP
1940 DUKE STREET
ALEXANDRIA, VA 22314
Assignment: 2
Reel/Frame:
043420/0247Recorded: 08/03/2017Pages: 8
Conveyance:
CORRECTIVE ASSIGNMENT TO CORRECT THE FOURTH ASSIGNOR'S EXECUTION DATE PREVIOUSLY RECORDED ON REEL 042566 FRAME 0601. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
Assignors:
NAKAGAWA, HISASHI
Exec Dt:
05/26/2017
SHIRATANI, MOTOHIRO
Exec Dt:
05/26/2017
NARUOKA, TAKEHIKO
Exec Dt:
05/31/2017
NAGAI, TOMOKI
Exec Dt:
05/29/2017
Assignee:
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU
TOKYO, JAPAN
Correspondent:
OBLON, ET AL.
1940 DUKE STREET
ALEXANDRIA, VA 22314

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