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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
10/22/2019
Application #:
15840178
Filing Dt:
12/13/2017
Publication #:
Pub Dt:
06/28/2018
Inventors:
Young Jung Lee, Jae-Woo Ryu, Byung Chun Kim, Robert J. Falster, Jun Hwan Ji et al
Title:
METHOD OF TREATING SILICON WAFERS TO HAVE INTRINSIC GETTERING AND GATE OXIDE INTEGRITY YIELD
Assignment: 1
Reel/Frame:
046342/0596Recorded: 07/13/2018Pages: 12
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
03/08/2017
Exec Dt:
03/08/2017
Exec Dt:
03/08/2017
Exec Dt:
12/13/2017
Exec Dt:
03/08/2017
Exec Dt:
03/14/2017
Exec Dt:
03/08/2017
Exec Dt:
03/08/2017
Assignee:
9 BATTERY ROAD #15-1
STRAITS TRADING BUILDING
SINGAPORE, SINGAPORE 049910
Correspondent:
RICHARD A. SCHUTH
ARMSTRONG TEASDALE LLP
7700 FORSYTH BLVD., SUITE 1800
ST. LOUIS, MO 63105

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