Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
|
Issue Dt:
|
03/10/2020
|
Application #:
|
15542296
|
Filing Dt:
|
07/07/2017
|
|
Publication #:
|
|
Pub Dt:
|
09/20/2018
| | | | |
|
Inventors:
|
Shigeo IRIE, Takashi YOSHII, Keiichi MASUNAGA, Yukio INAZUKI, Hideo KANEKO et al
|
|
Title:
|
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND MASK PATTERN FORMATION METHOD
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 6-1, OHTEMACHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 1000004 |
|
|
|
|
| BIRCH, STEWART, KOLASCH & BIRCH, LLP |
| 8110 GATEHOUSE ROAD, SUITE 100E |
| FALLS CHURCH, VA 22042 |
|
|
Search Results as of:
04/29/2024 03:01 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
