Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/19/2021
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Application #:
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16014161
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Filing Dt:
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06/21/2018
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Publication #:
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Pub Dt:
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10/18/2018
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Inventors:
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Naoya HATAKEYAMA, Akiyoshi GOTO, Yasunori YONEKUTA
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Title:
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PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, MONOMER FOR PRODUCING RESIN FOR SEMICONDUCTOR DEVICE MANUFACTURING PROCESS, RESIN, METHOD FOR PRODUCING RESIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 26-30, NISHIAZABU 2-CHOME |
| MINATO-KU, TOKYO, JAPAN 1068620 |
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| SUGHRUE MION, PLLC |
| 2100 PENNSYLVANIA AVE. NW |
| WASHINGTON, DC 20037-3213 |
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