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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
10720322
Issue Dt:
07/21/2020
Application #:
16167225
Filing Dt:
10/22/2018
Publication #:
20190057857
Pub Dt:
02/21/2019
Inventors:
Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani et al
Title:
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON TOP SURFACE
Assignment: 1
Reel/Frame:
047267/0711Recorded: 10/22/2018Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
ISHIKAWA, DAI
Exec Dt:
10/05/2017
FUKAZAWA, ATSUKI
Exec Dt:
10/05/2017
SHIBA, EIICHIRO
Exec Dt:
10/05/2017
UEDA, SHINYA
Exec Dt:
10/05/2017
EBISUDANI, TAISHI
Exec Dt:
10/05/2017
CHUN, SEUNGJU
Exec Dt:
10/05/2017
YOO, YONGMIN
Exec Dt:
10/05/2017
MIN, YOONKI
Exec Dt:
10/05/2017
KIM, SEYONG
Exec Dt:
10/05/2017
Assignee:
ASM IP HOLDING B.V.
VERSTERKERSTRAAT 8, 1322 AP
ALMERE, NETHERLANDS
Correspondent:
SNELL & WILMER L.L.P.
400 EAST VAN BUREN STREET, SUITE 1900
ONE ARIZONA CENTER
PHOENIX, AZ 85004-2202

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