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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
10665450
Issue Dt:
05/26/2020
Application #:
16104352
Filing Dt:
08/17/2018
Publication #:
20190057863
Pub Dt:
02/21/2019
Inventors:
WEI V. TANG, SHIH CHUNG CHEN, YU LEI, NAOMI YOSHIDA, SIDDARTH KRISHNAN, YIXIONG YANG et al
Title:
METHODS AND APPARATUS FOR DOPING ENGINEERING AND THRESHOLD VOLTAGE TUNING BY INTEGRATED DEPOSITION OF TITANIUM NITRIDE AND ALUMINUM FILMS
Assignment: 1
Reel/Frame:
049727/0522Recorded: 07/11/2019Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
YANG, YIXIONG
Exec Dt:
04/11/2019
MA, PAUL F.
Exec Dt:
08/29/2018
TANG, WEI V.
Exec Dt:
05/03/2019
ZHANG, WENYU
Exec Dt:
04/11/2019
CHEN, SHIH CHUNG
Exec Dt:
05/06/2019
LIN, CHEN HAN
Exec Dt:
04/15/2019
LIN, CHI-CHOU
Exec Dt:
05/19/2019
XU, YI
Exec Dt:
04/15/2019
LEI, YU
Exec Dt:
04/14/2019
YOSHIDA, NAOMI
Exec Dt:
04/18/2019
DONG, LIN
Exec Dt:
05/16/2019
KRISHNAN, SIDDARTH
Exec Dt:
07/03/2019
Assignee:
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE
SANTA CLARA, CALIFORNIA 95054
Correspondent:
MOSER TABOADA/ALAN TABOADA
1030 BROAD STREET
SUITE 203
SHREWSBURY, NJ 07702

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