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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
11112697
Issue Dt:
09/07/2021
Application #:
16272962
Filing Dt:
02/11/2019
Publication #:
20190187563
Pub Dt:
06/20/2019
Inventors:
Douglas A. BUCHBERGER JR., Ludovic GODET, Daniel J. WOODRUFF, Robert B. MOORE et al
Title:
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WAFERS
Assignment: 1
Reel/Frame:
049162/0210Recorded: 05/13/2019Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
BABAYAN, VIACHSLAV
Exec Dt:
03/04/2016
BUCHBERGER, DOUGLAS A., JR.
Exec Dt:
03/04/2016
LIANG, QIWEI
Exec Dt:
03/04/2016
GODET, LUDOVIC
Exec Dt:
04/06/2016
NEMANI, SRINIVAS D.
Exec Dt:
03/15/2016
WOODRUFF, DANIEL J.
Exec Dt:
02/25/2016
HARRIS, RANDY
Exec Dt:
02/25/2016
MOORE, ROBERT B.
Exec Dt:
02/25/2016
Assignee:
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE
SANTA CLARA, CALIFORNIA 95054
Correspondent:
PATTERSON & SHERIDAN, LLP
24 GREENWAY PLAZA, SUITE 1600
HOUSTON, TX 77046

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