Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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02/01/2022
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Application #:
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16490010
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Filing Dt:
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08/29/2019
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Publication #:
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Pub Dt:
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12/19/2019
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Inventors:
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Yohei IKEBE, Junichi HORIKAWA, Takahiro ONOUE, Mizuki KATAOKA
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Title:
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REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
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Assignment:
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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6-10-1 NISHI-SHINJUKU, SHINJUKU-KU |
TOKYO, JAPAN 1608347 |
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KILPATRICK TOWNSEND & STOCKTON LLP |
1100 PEACHTREE STREET |
SUITE 2800 |
ATLANTA, GA 30309 |
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