Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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01/18/2022
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Application #:
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16487948
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Filing Dt:
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08/22/2019
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Publication #:
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Pub Dt:
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02/06/2020
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Inventors:
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Nobuyuki SAITO, Yukari KOIBUCHI, Yutaka NAMATAME
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Title:
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PHOTOSENSITIVE RESIN COMPOSITION, CURED PATTERN PRODUCTION METHOD, CURED PRODUCT, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTIVE LAYER, AND ELECTRONIC COMPONENT
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 4-25, KORAKU 1-CHOME, BUNKYO-KU |
| TOKYO, JAPAN 112-0004 |
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| FITCH, EVEN, TABIN & FLANNERY, LLP |
| 120 SOUTH LASALLE STREET, SUITE 2100 |
| CHICAGO, IL 60603-3406 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 4-25, KORAKU 1-CHOME, BUNKYO-KU |
| BUNKYO-KU |
| TOKYO, JAPAN 112-0004 |
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| ALAN E. SCHIAVELLI |
| 1250 23RD STREET NW, SUITE 410 |
| WASHINGTON, DC 20037-1164 |
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