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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
08/15/2023
Application #:
16633997
Filing Dt:
01/24/2020
Publication #:
Pub Dt:
06/25/2020
Inventors:
Minho Jung, Namkyu Lee, Jinsu Ham, Kyunphyo Lee, Kwangkuk Lee, Kwangho Lee, Hyeryoung Lee et al
Title:
Polymer For Formation of Resist Underlayer Film, Composition for Formation of Resist Underlayer Film Comprising Same and Method for Manufacturing Semiconductor Element by Using Same
Assignment: 1
Reel/Frame:
051766/0561Recorded: 02/10/2020Pages: 11
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
01/22/2020
Exec Dt:
01/16/2020
Exec Dt:
01/17/2020
Exec Dt:
01/16/2020
Exec Dt:
01/16/2020
Exec Dt:
01/21/2020
Exec Dt:
01/20/2020
Exec Dt:
01/20/2020
Assignees:
26, JONG-RO, JONGNO-GU
SEOUL, KOREA, REPUBLIC OF 03188
26, JONG-RO, JONGNO-GU
SEOUL, KOREA, REPUBLIC OF 03188
Correspondent:
THE WEBB LAW FIRM
420 FT. DUQUESNE BLVD
ONE GATEWAY CENTER, SUITE 1200
PITTSBURGH, PA 15222
Assignment: 2
Reel/Frame:
061371/0332Recorded: 09/02/2022Pages: 6
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
09/01/2021
Assignee:
26, JONG-RO, JONGNO-GU
SEOUL, KOREA, REPUBLIC OF
Correspondent:
CPA GLOBAL LIMITED
LIBERATION HOUSE
CASTLE STREET
ST HELIER, JE1 1BL JERSEY

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