Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/07/2022
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Application #:
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16527948
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Filing Dt:
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07/31/2019
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Publication #:
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Pub Dt:
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02/04/2021
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Inventors:
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Kuo-Cheng Ching, Zhi-Chang Lin, Shi Ning Ju, Chih-Hao Wang, Kuan-Ting Pan
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Title:
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METHOD OF FORMING A SEMICONDUCTOR STRUCTURE INCLUDING LATERALLY ETCHING SEMICONDUCTOR MATERIAL IN FIN RECESS REGION AND DEPOSITING METAL GATE THEREIN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 8, LI-HSIN RD. 6 |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSIN-CHU, TAIWAN 300-77 |
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| FINNEGAN, HENDERSON, FARABOW, GARRETT & |
| 901 NEW YORK AVENUE, NW |
| WASHINGTON, DC 20001-4413 |
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