Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/05/2022
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Application #:
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16715929
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Filing Dt:
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12/16/2019
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Publication #:
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Pub Dt:
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04/29/2021
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Inventors:
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Chin-Lung TING, Hong-Sheng HSIEH, Chien-Hsing LEE, Jung-Chuan WANG
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Title:
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MASK SUBSTRATE AND METHOD FOR FORMING MASK SUBSTRATE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 160 KESYUE RD., JHU-NAN SITE, HSINCHU SCIENCE PARK, JHU NAN |
| MIAO-LI COUNTY, TAIWAN 350 |
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| MCCLURE, QUALEY & RODACK, LLP |
| 280 INTERSTATE NORTH CIRCLE SE |
| SUITE 550 |
| ATLANTA, GA 30339 |
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