Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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04/05/2022
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Application #:
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17085206
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Filing Dt:
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10/30/2020
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Publication #:
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Pub Dt:
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07/01/2021
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Inventors:
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Da-Wei YU, Kuan-Wen LIN, Hsin-Chang LEE, Chen-Yang LIN, Li-Hsin WANG, Chia-Jen CHEN
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Title:
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PARTICLE REMOVING ASSEMBLY AND METHOD OF CLEANING MASK FOR LITHOGRAPHY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO.8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN 300 |
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| MCDERMOTT WILL & EMERY LLP |
| THE MCDERMOTT BUILDING |
| 500 NORTH CAPITOL STREET, N.W. |
| WASHINGTON, DC 20001 |
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Assignment:
2
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CORRECTIVE ASSIGNMENT TO CORRECT THE OMITTED 5TH, 6TH INVENTOR'S NAME PREVIOUSLY RECORDED AT REEL: 055619 FRAME: 0800. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT .
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| NO.8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN 300 |
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| MCDERMOTT WILL & EMERY LLP |
| THE MCDERMOTT BUILDING |
| 500 NORTH CAPITOL STREET, NW |
| WASHINGTON, DC 20001 |
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