Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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05/14/2024
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Application #:
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17529124
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Filing Dt:
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11/17/2021
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Publication #:
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Pub Dt:
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03/10/2022
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Inventors:
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Hirotomo KAWAHARA, Hiroshi HANEKAWA, Toshiyuki UNO, Masafumi AKITA
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| MICHAEL D. KAMINSKI |
| FOLEY & LARDNER LLP |
| 3000 K STREET, N.W., SUITE 600 |
| WASHINGTON, DC 20007 |
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05/03/2024 10:49 PM
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