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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
17478197
Filing Dt:
09/17/2021
Publication #:
20220080476
Pub Dt:
03/17/2022
Inventors:
Norihiko AMIKURA, Hideyuki OSADA, Genichi NANASAKI, Seiichi KAISE, Masatomo KITA et al
Title:
SUBSTRATE PROCESSING APPARATUS, PURGE GAS CONTROL METHOD, AND VACUUM TRANSFER CHAMBER CLEANING METHOD
Assignment: 1
Reel/Frame:
057516/0554Recorded: 09/17/2021Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
AMIKURA, NORIHIKO
Exec Dt:
09/09/2021
OSADA, HIDEYUKI
Exec Dt:
09/09/2021
NANASAKI, GENICHI
Exec Dt:
09/09/2021
KAISE, SEIICHI
Exec Dt:
09/09/2021
KITA, MASATOMO
Exec Dt:
09/09/2021
TAKIZAWA, TAKASHI
Exec Dt:
09/14/2021
TAKAHASHI, EIJI
Exec Dt:
09/13/2021
Assignee:
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU
TOKYO, JAPAN 107-6325
Correspondent:
ROTHWELL, FIGG, ERNST & MANBECK, P.C.
607 14TH STREET, N.W.
SUITE 800
WASHINGTON, DC 20005

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