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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
17861566
Filing Dt:
07/11/2022
Publication #:
Pub Dt:
01/19/2023
Inventors:
Hajime NAKABAYASHI, Tomohito YAMAJI, Kazuki YAMADA, Ryuichi ASAKO
Title:
PATTERN FORMATION METHOD AND PHOTOSENSITIVE HARD MASK
Assignment: 1
Reel/Frame:
060581/0311Recorded: 07/21/2022Pages: 22
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
06/27/2022
Exec Dt:
07/12/2022
Exec Dt:
06/27/2022
Exec Dt:
06/28/2022
Assignee:
3-1 AKASAKA 5-CHOME
MINATO-KU
TOKYO, JAPAN 107-6325
Correspondent:
NATH, GOLDBERG & MEYER
112 S WEST ST
ALEXANDRIA, VA 22314

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