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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
02/13/2024
Application #:
18097085
Filing Dt:
01/13/2023
Publication #:
Pub Dt:
06/01/2023
Inventors:
Wen LO, Shih-Ming CHANG
Title:
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
Assignment: 1
Reel/Frame:
063909/0940Recorded: 06/09/2023Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
10/30/2019
Exec Dt:
10/30/2019
Assignee:
NO. 8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK
HSINCHU, TAIWAN 300
Correspondent:
MCDERMOTT WILL & EMERY LLP
500 NORTH CAPITOL STREET, NW
WASHINGTON, DC 20001

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