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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
18066510
Filing Dt:
12/15/2022
Publication #:
Pub Dt:
07/06/2023
Inventors:
In Kwon Kim, Sang Kyun Kim, Hyo San Lee, Yea Rin Byun, Bo Yun Kim, Bo Un Yoon et al
Title:
POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING APPARATUS INLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE CHEMICAL MECHANICAL POLISHING APPARATUS
Assignment: 1
Reel/Frame:
062103/0609Recorded: 12/15/2022Pages: 7
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
09/06/2022
Exec Dt:
09/06/2022
Exec Dt:
09/06/2022
Exec Dt:
09/06/2022
Exec Dt:
09/07/2022
Exec Dt:
09/06/2022
Exec Dt:
09/06/2022
Assignee:
129, SAMSUNG-RO, YEONGTONG-GU
SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF 16677
Correspondent:
MYERS BIGEL,P.A.
PO BOX 37428
RALEIGH, NC 27627

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