Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17725040
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Filing Dt:
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04/20/2022
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Publication #:
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Pub Dt:
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10/26/2023
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Inventors:
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Eric Chih-Fang Liu, Emilia Hirsch, Angelique Raley, Ya-Ming Chen, Shihsheng Chang et al
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Title:
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Methods To Provide Anisotropic Etching Of Metal Hard Masks Using A Radio Frequency Modulated Pulsed Plasma Scheme
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Assignment:
1
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CORRECTIVE ASSIGNMENT TO CORRECT THE APPLICATION NUMBER PREVIOUSLY RECORDED AT REEL: 059653 FRAME: 0504. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
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| 3-1 AKASAKA 5-CHOME, MINATO-KU |
| TOKYO, JAPAN 107-6325 |
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| TEL-EGAN, ENDERS & HUSTON LLP. |
| 1101 S CAPITAL OF TEXAS HWY |
| BLDG. C, SUITE 200 |
| AUSTIN, TX 78746 |
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