Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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18140284
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Filing Dt:
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04/27/2023
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Publication #:
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Pub Dt:
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11/16/2023
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Inventors:
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Keisuke SAKURAI, Shohei MIMURA, Takeshi ISHII
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Title:
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Reflective Photomask Blank, and Method for Manufacturing Reflective Photomask
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 4-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN |
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| BIRCH STEWART KOLASCH & BIRCH LLP |
| 8110 GATEHOUSE ROAD, SUITE 100 EAST |
| FALLS CHURCH, VA 22042 |
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