Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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18144963
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Filing Dt:
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05/09/2023
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Publication #:
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Pub Dt:
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11/16/2023
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Inventors:
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Keiichi Masunaga, Jun Hatakeyama, Satoshi Watanabe, Kenji Funatsu, Masahiro Fukushima et al
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Title:
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MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 4-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN |
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| WHDA, LLP |
| 8500 LEESBURG PIKE |
| SUITE 7500 |
| TYSONS, VA 22182 |
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05/09/2024 05:58 PM
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