Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 004838/0575 | |
| Pages: | 2 |
| | Recorded: | 02/23/1988 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/26/1989
|
Application #:
|
07159292
|
Filing Dt:
|
02/23/1988
|
|
Title:
|
PROCESS FOR FORMING PHOTORESIST PATTERN USING CONTRAST ENHANCEMENT LAYER WIT ABIETIC ACID
|
|
|
Assignees
|
|
|
|
|
| 7-12, TORANOMON 1-CHOME, MINATO-KU |
| TOKYO, JAPAN |
|
|
|
|
|
| 9-17, AZABUDAI 1-CHOME, MINATO-KU |
| TOKYO 106, JAPAN |
|
|
Correspondence name and address
|
| |
WENDEROTH, LIND & PONACK
|
| |
SUITE 1100
|
| |
1750 PENNSYLVANIA AVE., N.W.
|
| |
WASHINGTON, D.C. 20006
|
Search Results as of:
04/20/2024 12:15 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
