Patent Assignment Details
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| Reel/Frame: | 007984/0744 | |
| Pages: | 2 |
| | Recorded: | 06/04/1996 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/16/1997
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Application #:
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08593915
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Filing Dt:
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01/30/1996
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Title:
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PHOTOMASK-PATTERN-SHAPE EVALUATION METHOD, PHOTOMASK, PHOTOMASK MANUFACTURING METHOD, PHOTOMASK-PATTERN FORMING METHOD, AND EXPOSURE METHOD
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Assignee
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| 7-35, KITASHINAGAWA, 6-CHOME, SHINAGAWA-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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HILL, STEADMAN & SIMPSON, P.C.
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LEWIS T. STEADMAN
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233 S. WACKER DRIVE
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85TH FLOOR SEARS TOWER
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CHICAGO, ILLINOIS 60606
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