Patent Assignment Details
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| Reel/Frame: | 008011/0716 | |
| Pages: | 4 |
| | Recorded: | 12/27/1995 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/26/1997
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Application #:
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08579269
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Filing Dt:
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12/27/1995
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Title:
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PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING THE SAME
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Assignee
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| 5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100 |
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Correspondence name and address
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OBLON, SPIVAK, MCCLELLAND, MAIER ET AL.
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NORMAN F. OBLON
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FOURTH FLOOR
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1755 JEFFERSON DAVIS HIGHWAY
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ARLINGTON, VA 22202
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