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Patent Assignment Details
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Reel/Frame:008069/0639   Pages: 3
Recorded: 05/28/1996
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 1
1
Patent #:
Issue Dt:
03/03/1998
Application #:
08656991
Filing Dt:
05/28/1996
Title:
METHOD FOR FABRICATING DOUBLE SILICIDE GATE ELECTRODE STRUCTURES ON CMOS-FIELD EFFECT TRANSISTORS
Assignors
1
Exec Dt:
05/09/1996
2
Exec Dt:
05/09/1996
Assignee
1
SCIENCE-BASED INDUSTRIAL PARK
121, PARK AVE. 3
HSIN-CHU, TAIWAN R.O.C
Correspondence name and address
GEORGE O. SAILE
20 MCINTOSH DR.
POUGHKEEPSIE, NY 12603

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