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Patent #:
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Issue Dt:
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03/22/1983
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Application #:
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06275883
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Filing Dt:
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06/22/1981
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Title:
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POSITIVE NOVOLAK PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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07/16/1985
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Application #:
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06403935
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Filing Dt:
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08/02/1982
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Title:
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POSITIVE PHOTORESIST COMPOSITION WITH CRESOL-FORMALDEHYDE NOVOLAK RESINS
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Patent #:
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Issue Dt:
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05/27/1986
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Application #:
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06497262
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Filing Dt:
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05/23/1983
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Title:
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NON-GLASS CHEMICAL CONTAINER
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Patent #:
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Issue Dt:
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04/14/1987
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Application #:
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06608754
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Filing Dt:
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05/10/1984
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Title:
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PHOTOSENSITIVE POLYMERS AS COATING MATERIALS
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Patent #:
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Issue Dt:
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12/16/1986
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Application #:
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06608755
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Filing Dt:
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05/10/1984
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Title:
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POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE
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Patent #:
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Issue Dt:
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05/06/1986
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Application #:
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06666743
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Filing Dt:
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10/31/1984
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Title:
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POSITIVE PHOTORESIST WITH CRESOL-FORMALDEHYDE NOVOLAK RESIN AND PHOTOSENSITIVE NAPHTHOQUINONE DIAZIDE
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Patent #:
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Issue Dt:
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12/16/1986
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Application #:
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06795591
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Filing Dt:
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11/06/1985
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Title:
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A PROCESS FOR IRRADIATING POLYIMIDIES
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Patent #:
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Issue Dt:
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10/06/1987
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Application #:
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06796380
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Filing Dt:
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11/08/1985
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Title:
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POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
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Patent #:
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Issue Dt:
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10/20/1987
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Application #:
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06818950
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Filing Dt:
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01/15/1986
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Title:
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POLYAMIDE ESTER PHOTORESIST FORMULATIONS OF ENHANCED SENSITIVITY
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Patent #:
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Issue Dt:
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04/12/1988
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Application #:
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06859683
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Filing Dt:
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05/05/1986
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Title:
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CYCLIC ACETALS OR KETALS OF BETA-KETO ESTERS OR AMIDES
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Patent #:
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Issue Dt:
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06/30/1987
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Application #:
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06895603
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Filing Dt:
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08/07/1986
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Title:
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POLYIMIDES AND A PROCESS FOR THEIR PREPARATION
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Patent #:
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Issue Dt:
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12/08/1987
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Application #:
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06895628
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Filing Dt:
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08/11/1986
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Title:
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DEVELOPMENT OF POSITIVE-WORKING PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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03/29/1988
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Application #:
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07001312
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Filing Dt:
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01/08/1987
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Title:
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NOVEL ORGANOMETALLIC POLYMERS
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Patent #:
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Issue Dt:
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01/10/1989
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Application #:
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07068397
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Filing Dt:
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07/01/1987
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Title:
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LIGHT-SENSITIVE 1,2-NAPHTHOQUINONE-2-DIAZIDE-4- SULFONIC ACID MONOESTERS OF CYCLOALKYL SUSTITUTED PHENOL AND THEIR USE IN LIGHT- SENSITIVE MIXTURES
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Patent #:
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Issue Dt:
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04/03/1990
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Application #:
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07070749
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Filing Dt:
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07/06/1987
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Title:
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POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
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Patent #:
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Issue Dt:
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04/03/1990
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Application #:
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07070750
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Filing Dt:
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07/06/1987
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Title:
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POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
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Patent #:
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Issue Dt:
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02/20/1990
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Application #:
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07104697
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Filing Dt:
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10/05/1987
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Title:
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PHOTORESIST COMPOSITIONS CONTAINING SELECTED 6-ACETOXY CYCLOHEXADIENONE PHOTOSENSITIZERS AND NOVOLAK RESINS
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Patent #:
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Issue Dt:
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02/28/1989
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Application #:
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07115544
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Filing Dt:
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10/28/1987
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Title:
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AMINO-TETRAALKYLBENZOYLPHTHALIC ACIDS
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Patent #:
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Issue Dt:
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02/21/1989
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Application #:
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07125668
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Filing Dt:
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11/27/1987
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Title:
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CYCLIC ACETALS OR KETALS OF 8-KETO ESTERS OR AMIDES
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Patent #:
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Issue Dt:
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12/12/1989
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Application #:
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07141128
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Filing Dt:
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01/06/1988
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Title:
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USE OF PARTICULAR MIXTURES OF ETHYL LACTATE AND METHYL ETHYL KETONE TO REMOVE UNDESIRABLE PERIPHERAL MATERIAL (E.G. EDGE BEADS) FROM PHOTORESIST-COATED SUBSTRATES
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Patent #:
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Issue Dt:
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09/25/1990
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Application #:
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07217512
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Filing Dt:
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07/11/1988
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Title:
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LIGHT-SENSITIVE O-QUINONE DIAZIDE COMPOSITION AND PRODUCT WITH PHENOLIC NOVOLAK PREPARED BY CONDENSATION WITH HALOACETOALDEHYDE
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Patent #:
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Issue Dt:
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10/23/1990
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Application #:
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07269521
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Filing Dt:
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11/10/1988
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Title:
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POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT
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Patent #:
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Issue Dt:
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05/15/1990
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Application #:
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07281429
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Filing Dt:
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12/08/1988
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Title:
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AUTO-PHOTOCROSSLINKABLE COPOLYIMIDES AND POLYIMIDE COMPOSITIONS
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Patent #:
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Issue Dt:
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09/18/1990
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Application #:
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07290009
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Filing Dt:
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12/27/1988
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Title:
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SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES
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Patent #:
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Issue Dt:
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12/25/1990
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Application #:
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07308483
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Filing Dt:
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02/10/1989
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Title:
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PROCESS FOR THE PREPARATION OF 1,2-DISULFONE COMPOUNDS
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Patent #:
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Issue Dt:
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11/13/1990
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Application #:
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07325399
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Filing Dt:
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03/20/1989
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Title:
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THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS WITH ORTHO, ORTHO METHYLENE LINKAGE
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Patent #:
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Issue Dt:
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02/26/1991
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Application #:
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07333519
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Filing Dt:
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04/05/1989
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Title:
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PROCESS FOR COATING A PHOTORESIST COMPOSITION ONTO A SUBSTRATE
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Patent #:
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Issue Dt:
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09/29/1992
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Application #:
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07386659
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Filing Dt:
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07/31/1989
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Title:
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USE OF PARTICULAR MIXTURES OF ETHYL LACTATE AND METHYL ETHYL KETONE TO REMOVE UNDESIRABLE PERIPHERAL MATERIAL (E.G. EDGE BEADS) FROM PHOTORESIST-COATED SUBSTRATES
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Patent #:
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Issue Dt:
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12/03/1991
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Application #:
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07408849
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Filing Dt:
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09/18/1989
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Title:
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PROCESS FOR DEVELOPING SELECTED POSITIVE PHOTORESISTS
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Patent #:
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Issue Dt:
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06/01/1993
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Application #:
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07409221
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Filing Dt:
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09/19/1989
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Title:
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TRIS-(HYDROXYPHENYL) LOWER ALKANE COMPOUNDS AS SENSITIVITY ENHANCERS FOR O-QUINONEDIAZIDE CONTAINING RADIATION - SENSITIVE COMPOSITIONS AND ELEMENTS
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Patent #:
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Issue Dt:
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04/14/1992
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Application #:
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07430760
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Filing Dt:
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11/02/1989
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Title:
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POSITIVE PHOTORESIST COMPOSITION CONTAINING RADIATION SENSITIVE QUINONEDIAZIDE COMPOUND AND COMPLETELY ESTERIFIED POLYAMIC ACID POLYMER
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Patent #:
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Issue Dt:
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12/31/1991
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Application #:
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07467622
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Filing Dt:
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01/19/1990
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Title:
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DISUBSTITUTED AROMATIC DIANHYDRIDES
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Patent #:
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Issue Dt:
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04/07/1992
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Application #:
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07487563
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Filing Dt:
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03/02/1990
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Title:
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AUTO-PHOTOCROSSLINKABLE COPOLYIMIDES AND POLYIMIDE COMPOSITIONS
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Patent #:
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Issue Dt:
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11/05/1991
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Application #:
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07533258
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Filing Dt:
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06/04/1990
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Title:
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POSITIVE-WORKING PHOTORESIST PROCESS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT DURING PHOTORESIST COATING
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Patent #:
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Issue Dt:
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02/12/1991
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Application #:
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07534908
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Filing Dt:
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06/08/1990
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Title:
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SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES
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Patent #:
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Issue Dt:
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02/12/1991
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Application #:
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07534909
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Filing Dt:
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06/08/1990
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Title:
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PROCESS OF DEVELOPING A RADIATION IMAGED PRODUCT WITH TRINUCLEAR NOVOLAK OLIGOMER HAVING O-NAPHTHOQUINONE DIAZIDE SULFONYL GROUP
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Patent #:
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Issue Dt:
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10/01/1991
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Application #:
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07540054
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Filing Dt:
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06/18/1990
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Title:
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THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS AND THEIR USE IN LIGHT- SENSITIVE COMPOSITIONS
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Patent #:
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|
Issue Dt:
|
03/19/1991
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Application #:
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07540249
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Filing Dt:
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06/18/1990
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Title:
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PROCESS OF FORMING RESIST IMAGE IN POSITIVE PHOTORESIST WITH THERMALLY STABLE PHENOLIC RESIN
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Patent #:
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|
Issue Dt:
|
09/08/1992
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Application #:
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07545702
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Filing Dt:
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06/29/1990
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|
Title:
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POSITIVE PHOTORESIST COMPOSITION
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Patent #:
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Issue Dt:
|
06/18/1991
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Application #:
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07552394
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Filing Dt:
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09/21/1990
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|
Title:
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THERMALLY STABLE LIGHT-SENSITIVE COMPOSITION WITH O-QUINONE DIAZIDE AND PHENOLIC RESIN USED IN A METHOD OF FORMING A POSITIVE PHOTORESIST IMAGE
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Patent #:
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Issue Dt:
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07/21/1992
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Application #:
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07630673
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Filing Dt:
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12/20/1990
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Title:
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PROCESS FOR SELECTIVE REMOVAL OF DIMERIC SPECIES FROM PHENOLIC POLYMERS
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Patent #:
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|
Issue Dt:
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12/24/1991
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Application #:
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07662395
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Filing Dt:
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02/27/1991
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Title:
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DESENSITIZED QUINONE DIAZIDE COMPOUNDS UTILIZING MICROCRYSTALLINE CELLULOSE AS DESENSITIZING AGENT
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Patent #:
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Issue Dt:
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08/02/1994
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Application #:
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07692811
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Filing Dt:
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04/25/1991
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Title:
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POSITIVE DIAZO QUINONE PHOTORESIST COMPOSITIONS CONTAINING ANTIHALATION COMPOUND
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Patent #:
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Issue Dt:
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09/29/1992
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Application #:
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07702155
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Filing Dt:
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05/15/1991
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Title:
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PHOTORESIST COMPOSITION CONTAINING DIAZOQUINONE PHOTOSENSITIZER AND NOVOLAK RESIN CHARACTERIZED BY THE COMPLETE AND SELECTIVE REMOVAL OF DIMERIC SPECIES FROM THE NOVOLAK RESIN
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Patent #:
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|
Issue Dt:
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03/23/1993
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Application #:
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07711350
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Filing Dt:
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06/04/1991
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Title:
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SELECTED BLOCK PHENOLIC OLIGOMERS AND THEIR USE IN RADIATION-SENSITIVE RESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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02/23/1993
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Application #:
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07711351
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Filing Dt:
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06/04/1991
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Title:
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SELECTED BLOCK COPOLYMER NOVOLAK BINDER RESINS AND RAIATION-SENSITIVE RESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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08/17/1993
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Application #:
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07713891
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Filing Dt:
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06/12/1991
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Title:
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RADIATION-SENSITIVE COMPOSITIONS CONTAINING FULLY SUBSTITUTED NOVOLAK POLYMERS
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Patent #:
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Issue Dt:
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04/21/1992
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Application #:
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07731188
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Filing Dt:
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07/15/1991
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Title:
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BENZOATES CONTAINING A SUBSTITUENT HAVING OLEFINIC UNSATURATION
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Patent #:
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|
Issue Dt:
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08/29/1995
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Application #:
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07753488
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Filing Dt:
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09/03/1991
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Title:
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METHOD FOR REMOVING METAL IMPURITIES FROM RESIST COMPONENTS
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Patent #:
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Issue Dt:
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01/03/1995
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Application #:
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07753526
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Filing Dt:
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09/03/1991
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Title:
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METHOD FOR REMOVING IMPURITIES FROM RESIST COMPONENTS AND NOVOLAK RESINS
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Patent #:
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Issue Dt:
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08/29/1995
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Application #:
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07753533
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Filing Dt:
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09/03/1991
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Title:
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METHOD FOR REMOVING METAL IMPURITIES FROM RESIST COMPONENTS
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Patent #:
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Issue Dt:
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04/26/1994
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Application #:
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07787454
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Filing Dt:
|
11/04/1991
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Title:
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RADIATION-SENSITIVE COMPOSITIONS USING NOVOLAK RESINS MADE FROM A SUBSTITUTED BIS(HYDROXY PHENYL) METHANE AND A BIS(METHYLOL) - CRESOL
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Patent #:
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Issue Dt:
|
11/17/1992
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Application #:
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07825240
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Filing Dt:
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01/24/1992
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Title:
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PHOTORESIST DEVELOPER CONTAINING FLUORINATED AMPHOTERIC SURFACTANT
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Patent #:
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Issue Dt:
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11/24/1992
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Application #:
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07831119
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Filing Dt:
|
02/04/1992
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Title:
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BENZOATES CONTAINING A SUBSTITUENT HAVING OLEFINIC UNSATURATION
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Patent #:
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|
Issue Dt:
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12/28/1993
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Application #:
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07843798
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Filing Dt:
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02/27/1992
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|
Title:
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COPOLYMERS CROSSLINKABLE BY ACID CATALYSIS
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Patent #:
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Issue Dt:
|
08/24/1993
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Application #:
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07843799
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Filing Dt:
|
02/27/1992
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|
Title:
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PHOTOSENSITIVE COMPOSITIONS BASED ON POLYPHENOLS AND ACETALS
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Patent #:
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Issue Dt:
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08/23/1994
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Application #:
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07879021
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Filing Dt:
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05/06/1992
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Title:
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CHEMICALLY MODIFIED HYDROXY STYRENE POLYMER RESINS AND THEIR USE IN PHOTOACTIVE RESIST COMPOSITIONS WHEREIN THE MODIFYING AGENT IS MONOMETHYLOL PHENOL
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Patent #:
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Issue Dt:
|
01/04/1994
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Application #:
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07891011
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Filing Dt:
|
06/01/1992
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Title:
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POSITIVE-WORKING RADIATION SENSITIVE MIXTURES AND ARTICLES CONTAINING ALKALI-SOLUBLE BINDER, O-QUINONEDIAZIDE PHOTOACTIVE COMPOUND AND BLANKOPHOR FBW ACTINIC DYE
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Patent #:
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Issue Dt:
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04/05/1994
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Application #:
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07906183
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Filing Dt:
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06/29/1992
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Title:
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SELECTED CHELATE RESINS AND THEIR USE TO REMOVE MULTIVALENT METAL IMPURITIES FROM RESIST COMPONENTS
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Patent #:
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Issue Dt:
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03/22/1994
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Application #:
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07932128
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Filing Dt:
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08/15/1992
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Title:
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POSITIVE PHOTORESISTS CONTAINING QUINONE DIAZIDE PHOTOSENSITIZER, ALKALI-SOLUBLE RESIN AND TETRA(HYDROXYPHENYL) ALKANE ADDITIVE
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Patent #:
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Issue Dt:
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10/18/1994
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Application #:
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07979498
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Filing Dt:
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11/20/1992
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Title:
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RADIATION-SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
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04/12/1994
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Application #:
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07984700
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Filing Dt:
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12/03/1992
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Title:
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SELECTED BLOCK PHENOLIC OLIGOMERS AND THEIR USE IN PHENOLIC RESIN COMPOSITIONS AND IN RADIATION-SENSITIVE RESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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09/13/1994
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Application #:
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07986223
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Filing Dt:
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12/07/1992
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Title:
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NOVOLAK RESINS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS WHEREIN THE NOVOLAK RESINS ARE MADE BY CONDENSING 2,6-DIMETHYLPHENOL, 2,3-DIMETHYLPHENOL, A PARA-SUBSTITUTED PHENOL AND AN ALDEHYDE
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Patent #:
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Issue Dt:
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01/04/1994
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Application #:
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08011565
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Filing Dt:
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02/01/1993
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Title:
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SESAMOL/ALDEHYDE CONDENSATION PRODUCTS AS SENSITIVITY ENHANCERS FOR RADIATION SENSITIVE MIXTURES
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Patent #:
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Issue Dt:
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10/26/1993
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Application #:
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08011572
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Filing Dt:
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02/01/1993
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Title:
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PROCESS OF DEVELOPING A POSITIVE PATTERN IN AN O-QUINONE DIAZIDE PHOTORESIST CONTAINING A TRIS-(HYDROXYPHENYL) LOWER ALKANE COMPOUND SENSITIVITY ENHANCER
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Patent #:
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Issue Dt:
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01/04/1994
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Application #:
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08015055
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Filing Dt:
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02/08/1993
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Title:
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SELECTED NOVOLAK RESIN PLANARIZATION LAYER FOR LITHOGRAPHIC APPLICATIONS
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Patent #:
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Issue Dt:
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06/21/1994
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Application #:
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08037488
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Filing Dt:
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03/24/1993
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Title:
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POSITIVE PHOTORESISTS COMPRISING A NOVOLAK RESIN MADE FROM 2,3- DIMETHYL PHENOL, 2,3,5-TRIMETHYL PHENOL AND ALDEHYDE WITH NO META- CRESOL PRESENT
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Patent #:
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Issue Dt:
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01/10/1995
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Application #:
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08040230
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Filing Dt:
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03/30/1993
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Title:
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PHENYLACETATES AND THE USE THEREOF
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Patent #:
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Issue Dt:
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01/11/1994
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Application #:
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08045022
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Filing Dt:
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04/05/1993
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Title:
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O-NAPHTHOQUINONE DIAZIDE SULFONYL ESTERS OF 4-(4-HYDROXYPHENYL) CYCLOHEXANONE PHENOLIC DERIVATIVES WITH ASSOCIATED RADIATION SEN- SITIVE MIXTURES AND ARTICLES
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Patent #:
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Issue Dt:
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02/01/1994
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Application #:
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08045024
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Filing Dt:
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04/05/1993
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Title:
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SELECTED PHENOLIC DERIVATIVES OF 4-(4-HYDROXYPHENYL)-CYCLOHEXANONE AND THEIR USE AS SENSITIVITY ENHANCERS FOR RADIATION SENSITIVE MIXTURES
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Patent #:
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Issue Dt:
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06/28/1994
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Application #:
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08051720
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Filing Dt:
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04/22/1993
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Title:
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PHOTORESIST MATERIAL BASED ON POLYSTRYENES
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Patent #:
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Issue Dt:
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05/09/1995
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Application #:
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08057999
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Filing Dt:
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05/07/1993
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Title:
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HIGH ORTHO-ORTHO BONDED NOVOLAK BINDER RESINS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
|
06/28/1994
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Application #:
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08097426
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Filing Dt:
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07/26/1993
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Title:
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RADIATION-SENSITIVE COMPOSITIONS CONTAINING NOV0LAK POLYMERS MADE FROM FOUR PHENOLIC DERIVATIVES AND AN ALDEHYDE
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Patent #:
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Issue Dt:
|
02/08/1994
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Application #:
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08108266
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Filing Dt:
|
08/19/1993
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Title:
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PROCESS OF DEVELOPING AN IMAGE UTILIZING POSITIVE-WORKING RADIATION SENSITIVE MIXTURES CONTAINING ALKALI-SOLUBLE BINDER, O-QUINONEDIAZIDE PHOTOACTIVE COMPOUND AND BLANKOPHOR FBW ACTINIC DYE
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Patent #:
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Issue Dt:
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05/31/1994
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Application #:
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08122953
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Filing Dt:
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09/20/1993
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Title:
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RADIATION-SENSITIVE COMPOSITIONS CONTAINING 5-INDANOL IN THE BINDER RESIN AS A COMONOMER
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Patent #:
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Issue Dt:
|
07/12/1994
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Application #:
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08134448
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Filing Dt:
|
10/12/1993
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Title:
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POSITIVE IMAGE FORMATION UTILIZING RADIATION SENSITIVE MIXTURE CONTAINING DIMERIC OR TRIMERIC SESAMOL/ALDEHYDE CONDENSATION PRODUCTS AS SENSITIVITY ENHANCERS
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Patent #:
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Issue Dt:
|
05/17/1994
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Application #:
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08137522
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Filing Dt:
|
10/18/1993
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Title:
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PROCESS OF DEVELOPING A POSITIVE IMAGE UTILIZING O-NAPHTHOQUINONE DIAZIDE RADIATION-SENSITIVE ESTERS OF PHENOLIC DERIVATIVES OF 4-(4- HYDROXYPHENYL)CYCLOHEXANONE
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Patent #:
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Issue Dt:
|
09/13/1994
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Application #:
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08148235
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Filing Dt:
|
11/08/1993
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Title:
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POSITIVE IMAGE FORMATION UTILIZING O-QUINONEDIAZIDE COMPOSITION INCLUDING SELECTED PHENOLIC DERIVATIVES OF 4-(4-HYDROXYPHENYL)- CYCLOHEXANONE
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Patent #:
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Issue Dt:
|
11/29/1994
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Application #:
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08160818
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Filing Dt:
|
12/03/1993
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Title:
|
POSITIVE PHOTORESIST HAVING IMPROVED PROCESSING PROPERTIES
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Patent #:
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|
Issue Dt:
|
07/25/1995
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Application #:
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08180180
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Filing Dt:
|
01/11/1994
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Title:
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POSITIVE PHOTORESISTS WITH ENHANCED RESOLUTION AND REDUCED CRYSTALLISATION CONTAINING NOVEL TETRA(HYDROXYPHENYL)ALKANES
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Patent #:
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Issue Dt:
|
08/16/1994
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Application #:
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08194193
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Filing Dt:
|
02/09/1994
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Title:
|
PHENOLIC NOVOLAK RESIN COMPOSITIONS CONTAINING 5-INDANOL AND THEIR USE A PROCESS FOR FORMING POSITIVE RESIST PATTERNS
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Patent #:
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Issue Dt:
|
09/27/1994
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Application #:
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08194292
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Filing Dt:
|
02/09/1994
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Title:
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SELECTED STRUCTURALLY DEFINED NOVOLAK BINDER RESINS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
|
08/16/1994
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Application #:
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08194293
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Filing Dt:
|
02/09/1994
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Title:
|
SELECTED STRUCTURALLY DEFINED NOVOLAK BINDER RESINS AND THEIR USE IN PHOTORESIST PATTERN FORMATION
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Patent #:
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Issue Dt:
|
03/21/1995
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Application #:
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08227831
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Filing Dt:
|
04/14/1994
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Title:
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A PROCESS OF PHOTOPATTERNING A SUBSTRATE WITH A POSITIVE PHOTORESIST COMPOSITION CONTAINING A DIAZOQUINONE PHOTOSENSITIZER
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Patent #:
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Issue Dt:
|
12/05/1995
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Application #:
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08228775
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Filing Dt:
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04/18/1994
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Title:
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NON-CORROSION PHOTORESIST STRIPPING COMPOSITION
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Patent #:
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Issue Dt:
|
11/22/1994
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Application #:
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08236605
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Filing Dt:
|
05/02/1994
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|
Title:
|
COATED SUBSTRATE UTILIZING COMPOSITION INCLUDING SELECTED PHENOLIC DERIVATIVES OF 4-(4-HYDROXYPHENYL)-CYCLOHEXANONE AS SENSITIVITY ENHANCERS
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Patent #:
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Issue Dt:
|
03/14/1995
|
Application #:
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08249972
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Filing Dt:
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05/27/1994
|
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Title:
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POSITIVE PHOTORESIST HAVING IMPROVED PROCESSING PROPERTIES
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Patent #:
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Issue Dt:
|
08/27/1996
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Application #:
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08292899
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Filing Dt:
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08/19/1994
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Title:
|
CHEMICALLY AMPLIFIED RADIATION-SENSITIVE COMPOSITION
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Patent #:
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Issue Dt:
|
12/19/1995
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Application #:
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08323482
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Filing Dt:
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10/14/1994
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Title:
|
PHENYLACETATES AND THEIR USE IN RADIATION SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
|
10/31/1995
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Application #:
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08325020
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Filing Dt:
|
10/19/1994
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Title:
|
ENVIRONMENTALLY SAFE DISPENSING ASSEMBLY FOR ULTRA-PURE LIQUID CHEMICALS
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Patent #:
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Issue Dt:
|
09/24/1996
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Application #:
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08358131
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Filing Dt:
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12/16/1994
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Title:
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PHOTORESIST COMPOSITIONS CONTAINING COPOLYMERS HAVING ACID-LABILE GROUPS AND RECURRING UNITS DERIVED FROM EITHER N-(HYDROXYMETHYL)MALEIMIDE OR N-(ACETOXYMETHYL)MALEIMIDE OR BOTH
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Patent #:
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Issue Dt:
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02/27/1996
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Application #:
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08373685
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Filing Dt:
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01/17/1995
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Title:
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HIGH ORTHO-ORTHO BONDED NOVOLAK BINDER RESINS AND THEIR USE IN A PROCESS FOR FORMING POSITIVE RESIST PATTERNS
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Patent #:
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Issue Dt:
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12/05/1995
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Application #:
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08373705
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Filing Dt:
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01/17/1995
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Title:
|
HIGH ORTHO-ORTHO BONDED NOVOLAK BINDER RESINS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
|
07/30/1996
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Application #:
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08384501
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Filing Dt:
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02/01/1995
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Title:
|
SELECTED O-QUINONEDIAZIDE SULFONIC ACID ESTERS OF PHENOLIC COMPOUNDS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS
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Patent #:
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Issue Dt:
|
09/10/1996
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Application #:
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08399686
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Filing Dt:
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03/07/1995
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Title:
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TETRA(HYDROXPHENYL)ALKANES
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Patent #:
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Issue Dt:
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08/13/1996
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Application #:
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08436548
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Filing Dt:
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05/08/1995
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Title:
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NON-CORROSIVE PHOTORESIST STRIPPER COMPOSITION
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Patent #:
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Issue Dt:
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04/16/1996
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Application #:
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08436549
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Filing Dt:
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05/08/1995
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Title:
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NOVOLAK CONTAINING PHOTORESIST STRIPPER COMPOSITION
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Patent #:
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Issue Dt:
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10/01/1996
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Application #:
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08436550
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Filing Dt:
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05/08/1995
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Title:
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CHELATING REAGENT CONTAINING PHOTORESIST STRIPPER COMPOSITION
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Patent #:
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Issue Dt:
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08/20/1996
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Application #:
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08451599
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Filing Dt:
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05/26/1995
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Title:
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O-QUINONEDIAZIDE SULFONIC ACID ESTERS OF PHENOLIC COMPOUNDS AND THEIR USE IN FORMING POSITIVE IMAGES
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Patent #:
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Issue Dt:
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02/11/1997
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Application #:
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08451939
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Filing Dt:
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05/26/1995
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Title:
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SELECTED O-QUINONEDIAZIDE SULFONIC ACID ESTERS OF PHENOLIC COMPOUNDS AND THEIR USE IN RADIATION-SENSITIVE COMPOSITIONS
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