Patent Assignment Details
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Reel/Frame: | 008796/0468 | |
| Pages: | 3 |
| | Recorded: | 09/05/1997 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/21/1999
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Application #:
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08924861
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Filing Dt:
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09/05/1997
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Title:
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METHOD OF FORMING NARROW THERMAL SILICON DIOXIDE SIDE ISOLATION REGIONS IN A SEMICONDUCTOR SUBSTRATE AND MOS SEMICONDUCTOR DEVICES FABRICATED BY THIS METHOD
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Assignee
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2355 W. CHANDLER BLVD. |
CHANDLER, ARIZONA 85224 |
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Correspondence name and address
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HARRY M. WEISS & ASSOCIATES, P.C.
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HARRY M. WEISS
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4204 N. BROWN AVENUE
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SCOTTSDALE, AZ 85251
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