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Patent #:
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Issue Dt:
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10/29/1985
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Application #:
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06619468
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Filing Dt:
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06/11/1984
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Title:
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POSITIVE PHOTORESIST COMPOSITIONS WITH O-QUINONE DIAZIDE, NOVOLAK, AND PTLOPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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06/24/1986
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Application #:
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06655824
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Filing Dt:
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10/01/1984
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Title:
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POSITIVE PHOTORESIST PROCESSING WITH MID U-V RANGE EXPOSURE
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Patent #:
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Issue Dt:
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05/13/1986
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Application #:
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06706817
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Filing Dt:
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02/28/1985
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Title:
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LIGHT-SENSITIVE TRIS ESTER OF O-QUINONE DIAZIDE COMTAINING COMPOSITION FOR THE PREPARATION OF A POSITIVE-ACTING PHOTORESIST
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Patent #:
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Issue Dt:
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09/08/1987
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Application #:
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06791876
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Filing Dt:
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10/28/1985
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Title:
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PROCESS OF USING PHOTORESIST TREATING COMPOSITION CONTAINING A MIXTURE OF A HEXA-ALKYL DISTILAZANE, PROPYLENE GLYCOL ALKYL ETHER AND PROPY- LENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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06/30/1987
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Application #:
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06795549
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Filing Dt:
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11/01/1985
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Title:
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STEPPER FOR VLSI CIRCUIT MANUFACTURE UTILIZING RADIATION ABSORBING DYESTUFF FOR REGISTRATION OF ALIGNMENT MARKERS AND RETICLE
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Patent #:
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Issue Dt:
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10/20/1987
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Application #:
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06802514
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Filing Dt:
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11/27/1985
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Title:
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THERMALLY STABILIZED PHOTORESIST IMAGES
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Patent #:
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Issue Dt:
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04/05/1988
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Application #:
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06805641
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Filing Dt:
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12/06/1985
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Title:
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DEEP UV PHOTORESIST COMPOSITION WITH 1,3-DISUBSTITUTED -5-DIAZO BARBITURIC ACIDS
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Patent #:
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Issue Dt:
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01/19/1988
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Application #:
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06829874
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Filing Dt:
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02/18/1986
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Title:
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COPOLYMERS FROM MALEIMIDE AND ALIPHATIC VINYL ETHERS AND ESTERS USED IN POSITIVE PHOTORESIST
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Patent #:
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Issue Dt:
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06/06/1989
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Application #:
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06832116
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Filing Dt:
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02/24/1986
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Title:
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HIGH RESOLUTION PHOTORESIST OF IMIDE CONTAINING POLYMERS
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Patent #:
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Issue Dt:
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03/22/1988
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Application #:
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06858631
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Filing Dt:
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05/02/1986
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Title:
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NOVEL MIXED ESTER O-QUINONE PHOTOSENSITIZERS
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Patent #:
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Issue Dt:
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03/22/1988
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Application #:
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06859284
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Filing Dt:
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05/02/1986
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Title:
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NOVEL MIXED ESTER O-QUINONE PHOTOSENSITIZERS
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Patent #:
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Issue Dt:
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12/05/1989
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Application #:
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06921879
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Filing Dt:
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10/17/1986
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Title:
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HIGH TEMPERATURE POST EXPOSURE BAKING TREATMENT FOR POSITIVE PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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08/15/1989
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Application #:
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07024875
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Filing Dt:
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03/17/1987
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Title:
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POSITIVE PHOTORESIST THERMALLY STABLE COMPOSITIONS AND ELEMENTS HAVING DEEP UV RESPONSE WITH MALEIMIDE COPOLYMER
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Patent #:
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Issue Dt:
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02/28/1989
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Application #:
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07035413
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Filing Dt:
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04/06/1987
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Title:
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METHOD OF DEVELOPING A HIGH CONTRAST,POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING ALKANOLAMINE
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Patent #:
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Issue Dt:
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03/07/1989
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Application #:
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07052950
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Filing Dt:
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05/22/1987
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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Patent #:
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Issue Dt:
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03/27/1990
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Application #:
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07064437
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Filing Dt:
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06/22/1987
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Title:
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HIGH RESOLUTION PHOTORESIST BASED ON IMIDE CONTAINING POLYMERS
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Patent #:
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Issue Dt:
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02/21/1989
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Application #:
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07064969
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Filing Dt:
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08/27/1987
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Title:
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COMPOSITION CONTAINING A MIXTURE OF HEXA-ALKYL DISILAZANE AND PROPYLENE GLYCOL ALKYL ETHER AND/OR PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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05/22/1990
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Application #:
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07076098
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Filing Dt:
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07/21/1987
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Title:
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HYDROXY POLYIMIDES AND HIGH TEMPERATURE POSITIVE PHOTORESISTS THEREFROM
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Patent #:
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Issue Dt:
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02/07/1989
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Application #:
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07124742
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Filing Dt:
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11/24/1987
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Title:
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PHOTOSENSITIVE POLYIMIDE POLYMER COMPOSITIONS
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Patent #:
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Issue Dt:
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02/20/1990
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Application #:
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07140447
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Filing Dt:
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12/28/1987
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Title:
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1,3 DISUBSTITUTED-5-DIAZOBARBITURIC ACIDS
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Patent #:
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Issue Dt:
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04/14/1992
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Application #:
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07167068
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Filing Dt:
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03/11/1988
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Title:
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POSITIVE-WORKING PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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01/09/1990
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Application #:
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07170534
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Filing Dt:
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03/21/1988
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Title:
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MIXED ESTER O-QUINONE DIAZIDE PHOTOSENSITIZERS PROCESS OF PREPARATION
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Patent #:
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Issue Dt:
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02/20/1990
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Application #:
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07170538
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Filing Dt:
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03/21/1988
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Title:
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PHENILIC PHOTOSENSITIZERS CONTAINING QUINONE DIAZIDE AND ACIDIC HALIDE SUBSTITUTENTS
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Patent #:
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Issue Dt:
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09/19/1989
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Application #:
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07226258
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Filing Dt:
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08/02/1988
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Title:
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PROCESS FOR THE PRODUCTION OF 3-MONO OR 3,5, DISUBSTITUTED-4- ACETOXYSTYRENE ITS POLYMERIZATION, AND HYDROLYSIS
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Patent #:
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Issue Dt:
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04/24/1990
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Application #:
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07227404
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Filing Dt:
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08/02/1988
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Title:
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HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS WITH MIXED CRESOL AND HYDROXYBENZALDEHYDE PREPARED NOVOLAK AND PHOTOSENSITIVE DIAZOQUINONE
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Patent #:
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Issue Dt:
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05/29/1990
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Application #:
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07268639
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Filing Dt:
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11/08/1988
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-NAPHTHOQUINONE DIAZIDE AND CROSS- LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING
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Patent #:
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Issue Dt:
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06/05/1990
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Application #:
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07268640
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Filing Dt:
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11/08/1988
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING TREATMENT
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Patent #:
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Issue Dt:
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10/09/1990
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Application #:
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07289592
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Filing Dt:
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12/22/1988
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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Patent #:
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Issue Dt:
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09/19/1989
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Application #:
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07312170
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Filing Dt:
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02/21/1989
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Title:
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PROCESS FOR THE PRODUCTION OF 3-MONO OR 3,5 DISUBSTITUTED-4- ACETOXYSTYRENE, ITS POLYMERIZATION
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Patent #:
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Issue Dt:
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01/08/1991
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Application #:
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07352618
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Filing Dt:
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05/15/1989
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Title:
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PHOTORESIST TREATING COMPOSITION CONSISTING OF A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GYLCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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11/06/1990
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Application #:
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07361985
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Filing Dt:
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06/06/1989
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Title:
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HIGH RESOLUTION PHOTORESIST OF IMIDE CONTAINING POLYMERS
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Patent #:
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Issue Dt:
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08/06/1991
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Application #:
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07363245
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Filing Dt:
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06/08/1989
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Title:
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HYDROXLATED AROMATIC POLYAMIDE POLYMER CONTAINING BOUND NAPHTHOQUINONE DIAZIDE PHOTOSENSITIZER,METHOD OF MAKING AND USE
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Patent #:
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Issue Dt:
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10/22/1991
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Application #:
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07366088
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Filing Dt:
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06/14/1989
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Title:
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PHOTOCHEMICAL IMAGE PROCESS OF POSITIVE PHOTORESIST ELEMENT WITH MALEIMIDE COPOLYMER
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Patent #:
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Issue Dt:
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08/13/1991
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Application #:
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07373358
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Filing Dt:
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06/29/1989
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Title:
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DEEP U.V. PHOTORESIST COMPOSITIONS CONTAINING POLYCYCLIC CYCLOPENTANE -2- DIAZO-1,3-DIONE
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Patent #:
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Issue Dt:
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08/14/1990
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Application #:
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07376147
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Filing Dt:
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07/05/1989
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Title:
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POSITIVE O-QUINONE DIAZIDE PHOTORESIST WITH A SOLVENT MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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07/24/1990
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Application #:
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07376971
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Filing Dt:
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07/06/1989
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Title:
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HIGH SENSITIVITY MID AND DEEP UV RESIST
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Patent #:
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Issue Dt:
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08/31/1993
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Application #:
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07388769
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Filing Dt:
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08/02/1989
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Title:
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PHOTORESIST ARTICLE HAVING A PORTABLE, CONFORMABLE, BUILT-ON MASK
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Patent #:
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Issue Dt:
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04/21/1992
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Application #:
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07405493
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Filing Dt:
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09/11/1989
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Title:
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BASE DEVELOPABLE NEGATIVE ACTING PHOTORESISTS
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Patent #:
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|
Issue Dt:
|
07/30/1991
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Application #:
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07431342
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Filing Dt:
|
11/03/1989
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Title:
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PHOTOSENSITIVE ARTICLE HAVING PHENOLIC PHOTOSENSITIZERS CONTAINING QUINONE DIAZIDE AND ACID HALIDE SUBSTITUENTS
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Patent #:
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Issue Dt:
|
03/05/1991
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Application #:
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07454409
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Filing Dt:
|
12/21/1989
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Title:
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METHOD OF FORMING A THERMALLY STABLE MIXED ALDEHYDE NOVOLAK RESIN CONTAINING RESIST PATTERN AND THAT PATTERN ON A SUBSTRATE
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Patent #:
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Issue Dt:
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01/26/1993
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Application #:
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07475402
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Filing Dt:
|
02/05/1990
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Title:
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NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM
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Patent #:
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Issue Dt:
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02/26/1991
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Application #:
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07496240
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Filing Dt:
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03/20/1990
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Title:
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METHOD OF FORMING RESIST PATTERN AND THERMALLY STABLE AND HIGHLY RESOLVED RESIST PATTERN
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Patent #:
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Issue Dt:
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11/19/1991
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Application #:
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07501970
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Filing Dt:
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03/28/1990
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Title:
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METHOD FOR PRODUCING AND USING A POSITIVE PHOTORESIST WITH O-QUINONE DIAZIDE, NOVOLAK, AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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11/26/1991
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Application #:
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07502075
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Filing Dt:
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03/29/1990
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Title:
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BIZ-DIAZOTIZED DIARYL DIAMINE COUPLED DYES HAVING IMPROVED SOLUBILITY IN ORGANIC SOLVENT
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Patent #:
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Issue Dt:
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05/28/1991
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Application #:
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07517530
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Filing Dt:
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04/24/1990
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Title:
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METHOD OF PRODUCING AN IMAGE REVERSAL NEGATIVE PHOTORESIST HAVING A PHOTO-LABILE BLOCKED IMIDE
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Patent #:
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Issue Dt:
|
06/08/1993
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Application #:
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07530545
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Filing Dt:
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05/25/1990
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING TREAT- MENT AND ELEMENT PRODUCED THEREFROM
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Patent #:
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Issue Dt:
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08/13/1991
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Application #:
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07533966
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Filing Dt:
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06/06/1990
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Title:
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POSITIVE PHOTORESIST CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHERS AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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|
Issue Dt:
|
01/14/1992
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Application #:
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07543321
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Filing Dt:
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06/25/1990
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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|
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Patent #:
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|
Issue Dt:
|
04/28/1992
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Application #:
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07561798
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Filing Dt:
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08/02/1990
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Title:
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POSITIVE-WORKING PHOTORESIST COMPOSITION CONTAINING PURIFIED BROADBAND DYE AND PROCESS OF USING
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Patent #:
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|
Issue Dt:
|
03/10/1992
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Application #:
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07564665
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Filing Dt:
|
08/07/1990
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|
Title:
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METHOD OF DEVELOPING A HIGH CONTRAST, POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING A ALKANOLAMINE
|
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|
|
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Patent #:
|
|
Issue Dt:
|
06/30/1992
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Application #:
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07587320
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Filing Dt:
|
09/21/1990
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Title:
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HIGH CONTRAST, POSITIVE PHOTORESIST DEVELOPER CONTAINING ALKANOLAMINE
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Patent #:
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Issue Dt:
|
07/14/1992
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Application #:
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07614636
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Filing Dt:
|
11/16/1990
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|
Title:
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MIXED ALDEHYDE NOVOLAK RESINS USEFUL AS HIGH CONTRAST THERMAL STABILITY POSITIVE PHOTORESISTS
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|
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Patent #:
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|
Issue Dt:
|
04/05/1994
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Application #:
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07619154
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Filing Dt:
|
11/28/1990
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Title:
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PROCESS OF MAKING NAPHTHOQUINONE DIAZIDE ESTERS USING LACTONE SOLVENTS
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|
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Patent #:
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|
Issue Dt:
|
11/09/1993
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Application #:
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07628549
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Filing Dt:
|
12/17/1990
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|
Title:
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PHOTOSENSITIZER COMPOSITIONS CONTAINING DIAZO FLUORINATED ESTERS OF HEXAFLUORO-BIS-PHENOLS OR BIS-HEXAFLUOROETHERS
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Patent #:
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Issue Dt:
|
01/26/1993
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Application #:
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07693513
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Filing Dt:
|
04/30/1991
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|
Title:
|
DEEP U.V. PHOTORESIST COMPOSITIONS CONTAINING 4-TERT-BUTYLSTYRENE/ MALEIMIDE COPOLYMER AND CYCLOPENTANE -2-DIAZO-1,3-DIONE AND ELEMENTS UTILIZING THE COMPOSITIONS
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Patent #:
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Issue Dt:
|
11/10/1992
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Application #:
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07697832
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Filing Dt:
|
05/09/1991
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Title:
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PROCESS FOR THE PREPARATION OF PHOTOSENSITIVE COMPOSITIONS CONTAINING A MIXED ESTER O- QUINONE PHOTOSENSITIZER
|
|
|
|
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Patent #:
|
|
Issue Dt:
|
07/06/1993
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Application #:
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07739646
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Filing Dt:
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08/02/1991
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Title:
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POSITIVE PHOTORESIST CONTAINING DYES
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Patent #:
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Issue Dt:
|
09/01/1992
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Application #:
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07772976
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Filing Dt:
|
10/08/1991
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Title:
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POSITIVE PHOTORESIST COMPOSITIONS WITH O-QUINONE DIAZIDE, NOVOLAK AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
|
04/06/1993
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Application #:
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07782699
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Filing Dt:
|
10/25/1991
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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Patent #:
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Issue Dt:
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08/30/1994
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Application #:
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07812878
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Filing Dt:
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12/20/1991
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Title:
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COPOLYMERS OF 4-HYDROXYSTYRENE AND ALKYL SUBSTITUTED-4-HYDROXYSTYRENE IN ADMIXTURE WITH A PHOTOSENSITIZER TO FORM A PHOTOSENSITIVE COMPOSITION
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Patent #:
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Issue Dt:
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10/26/1993
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Application #:
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07815645
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Filing Dt:
|
12/30/1991
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-NAPHTHOQUINONE DIAZIDE AND CROSS- LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING
|
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Patent #:
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Issue Dt:
|
06/22/1993
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Application #:
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07847527
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Filing Dt:
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03/06/1992
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Title:
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DIAZO ESTER OF A BENZOLACTONE RING COMPOUND AND POSITIVE PHOTORESIST COMPOSITION AND ELEMENT UTILIZING THE DIAZO ESTER
|
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Patent #:
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Issue Dt:
|
08/30/1994
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Application #:
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07882207
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Filing Dt:
|
05/13/1992
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Title:
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DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY
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Patent #:
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Issue Dt:
|
05/04/1993
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Application #:
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07886976
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Filing Dt:
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05/21/1992
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Title:
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HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS HAVING NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT
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Patent #:
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Issue Dt:
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04/27/1993
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Application #:
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07919357
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Filing Dt:
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07/23/1992
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Title:
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HEXAHYDROXYBENZOPHENONE SULFONATE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS AND POSITIVE PHOTORESISTS EMPLOYING SAME
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Patent #:
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Issue Dt:
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12/06/1994
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Application #:
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07953031
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Filing Dt:
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09/28/1992
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Title:
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NOVOLAK RESIN MIXTURES
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Patent #:
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Issue Dt:
|
03/21/1995
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Application #:
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07978099
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Filing Dt:
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11/19/1992
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Title:
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IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST CONTAINING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND
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Patent #:
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Issue Dt:
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12/20/1994
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Application #:
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07996924
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Filing Dt:
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12/29/1992
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Title:
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NOVOLAK RESIN BLENDS FOR PHOTORESIST APPLICATIONS
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Patent #:
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Issue Dt:
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02/15/1994
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Application #:
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07996925
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Filing Dt:
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12/29/1992
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Title:
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PROCESS FOR PRODUCING A DEVELOPER HAVING A LOW METAL ION LEVEL
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Patent #:
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Issue Dt:
|
03/25/1997
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Application #:
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07997942
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Filing Dt:
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12/29/1992
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Title:
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USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
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Patent #:
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Issue Dt:
|
12/19/1995
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Application #:
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07999500
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Filing Dt:
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12/29/1992
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Title:
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METAL ION REDUCTION IN THE RAW MATERIALS AND USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESIN TO BE USED IN POSITIVE PHOTORESISTS
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Patent #:
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Issue Dt:
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03/15/1994
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Application #:
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08003206
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Filing Dt:
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01/12/1993
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Title:
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POSITIVE PHOTORESISTS EMPLOYING AN ISOMERIC MIXTURE OF TWO HEXAHYDROXY -BENZOPHENONE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS
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Patent #:
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Issue Dt:
|
06/20/1995
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Application #:
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08033076
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Filing Dt:
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03/10/1993
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Title:
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COMPOSITION AND METHOD FOR REMOVING PHOTORESIST COMPOSITION FROM SUBSTRATES SURFACES
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|
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Patent #:
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Issue Dt:
|
09/20/1994
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Application #:
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08042362
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Filing Dt:
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04/02/1993
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Title:
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METHOD FOR PRODUCING POSITIVE PHOTORESIST IMAGE UTILIZING DIAZO ESTER OF BENZOLACTONE RING COMPOUND AND DIAZO SULFONYL CHLORIDE
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|
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Patent #:
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Issue Dt:
|
10/15/1996
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Application #:
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08156182
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Filing Dt:
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11/22/1993
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Title:
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SEPARATING METALS USING A MODIFIED DEIONIZING RESIN
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Patent #:
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Issue Dt:
|
03/07/1995
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Application #:
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08168724
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Filing Dt:
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12/15/1993
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Title:
|
HEXAHYDROXYBENZOPHENONE SULFONATE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS AND POSITIVE PHOTORESISTS EMPLOYING SAME
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Patent #:
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|
Issue Dt:
|
03/07/1995
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Application #:
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08239096
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Filing Dt:
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05/06/1994
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Title:
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PROCESS OF MAKING A STABLE SOLUTION OF POLY(HYDROXYSTYRENE) FUNCTIONALIZED WITH T-BUTYLOXYCARBONYL GROUPS
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|
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Patent #:
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Issue Dt:
|
05/14/1996
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Application #:
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08258898
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Filing Dt:
|
06/10/1994
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Title:
|
METAL ION REDUCTION IN TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS
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|
|
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Patent #:
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|
Issue Dt:
|
08/06/1996
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Application #:
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08261646
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Filing Dt:
|
06/17/1994
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|
Title:
|
PHOTORESIST HAVING A LOW LEVEL OF METAL IONS
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|
|
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Patent #:
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|
Issue Dt:
|
01/14/1997
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Application #:
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08272962
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Filing Dt:
|
07/11/1994
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Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS AND PHOTORESISTS
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|
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Patent #:
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|
Issue Dt:
|
09/15/1998
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Application #:
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08277687
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Filing Dt:
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07/20/1994
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Title:
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COPOLYMERS OF 4-HYDROXYSTYRENE AND ALKYL SUBSTITUTED-4-HYDROXYSTYRENE
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Patent #:
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Issue Dt:
|
11/11/1997
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Application #:
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08294453
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Filing Dt:
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08/23/1994
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Title:
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METAL ION REDUCTION IN NOVOLAK RESIN SOLUTION USING AN ANION EXCHANGE RESIN
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|
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Patent #:
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|
Issue Dt:
|
04/23/1996
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Application #:
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08353000
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Filing Dt:
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12/09/1994
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Title:
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NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS
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Patent #:
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|
Issue Dt:
|
05/28/1996
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Application #:
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08365659
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Filing Dt:
|
12/30/1994
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Title:
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METAL ION REDUCTION IN NOVOLAK RESIN USING AN ION EXCHANGE CATALYST IN A POLAR SOLVENT AND PHOTORESISTS COMPOSITIONS THEREFROM
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|
|
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Patent #:
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|
Issue Dt:
|
03/25/1997
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Application #:
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08366614
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Filing Dt:
|
12/30/1994
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Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS SOLUTION IN PGMEA BY CHELATING ION EXCHANGE RESIN
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|
|
|
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Patent #:
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|
Issue Dt:
|
05/12/1998
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Application #:
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08366634
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Filing Dt:
|
12/30/1994
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|
Title:
|
ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB SURFACE FORCED STEAM DISTILLATION
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|
|
|
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Patent #:
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|
Issue Dt:
|
11/17/1998
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Application #:
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08366635
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Filing Dt:
|
12/30/1994
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|
Title:
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QUINONE DIAZIDE COMPOSITIONS CONTAINING LOW METALS P-CRESOL OLIGOMERS AND PROCESS OF PRODUCING THE COMPOSITION
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|
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Patent #:
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|
Issue Dt:
|
03/18/1997
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Application #:
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08385857
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Filing Dt:
|
02/09/1995
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|
Title:
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POSITIVE PHOTORESIST COMPOSITION COMPRISING A MIXED ESTER OF TRIS- HYDROXYPHENYL ETHANE AND A MIXED ESTER OF TRIHYDROXYBENZOPHENONE
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Patent #:
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|
Issue Dt:
|
06/10/1997
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Application #:
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08416234
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Filing Dt:
|
04/04/1995
|
|
Title:
|
METHOD FOR REMOVING PHOTORESIST COMPOSITION FROM SUBSTRATE SURFACES
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Patent #:
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|
Issue Dt:
|
12/03/1996
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Application #:
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08458588
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Filing Dt:
|
06/02/1995
|
|
Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS AND PHOTORESISTS
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Patent #:
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|
Issue Dt:
|
04/29/1997
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Application #:
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08460392
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Filing Dt:
|
06/02/1995
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Title:
|
METAL ION REDUCTION IN TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISIS
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Patent #:
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|
Issue Dt:
|
12/03/1996
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Application #:
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08460611
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Filing Dt:
|
06/02/1995
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Title:
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METAL ION REDUCTION IN BOTTOM ANTI-REFLECTIVE COATINGS FOR USE IN SEMICONDUCTOR DEVICE FORMATION
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Patent #:
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|
Issue Dt:
|
12/02/1997
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Application #:
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08530648
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Filing Dt:
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09/20/1995
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|
Title:
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FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
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Patent #:
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Issue Dt:
|
04/14/1998
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Application #:
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08530847
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Filing Dt:
|
09/20/1995
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Title:
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FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
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Patent #:
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|
Issue Dt:
|
05/12/1998
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Application #:
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08533828
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Filing Dt:
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09/26/1995
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Title:
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PROCESS FOR PRODUCING SURFACTANT HAVING A LOW METAL ION LEVEL AND DEVELOPER PRODUCED THEREFROM
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Patent #:
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Issue Dt:
|
08/12/1997
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Application #:
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08535701
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Filing Dt:
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09/28/1995
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|
Title:
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LOW METAL ION CONTAINING 4,4'-[1-[4-[1-(4-HYDROXYPHENYL)-1-METHYLETHYL]PHENYL]ETHYLIDENE]BISPHE NOL AND PHOTORESIST COMPOSITIONS THEREFROM
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Patent #:
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|
Issue Dt:
|
11/03/1998
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Application #:
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08537199
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Filing Dt:
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09/29/1995
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Title:
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LOW METALS PERFLUOROOCTANOIC ACID AND TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS
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Patent #:
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Issue Dt:
|
10/05/1999
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Application #:
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08562867
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Filing Dt:
|
11/27/1995
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Title:
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METAL ION REDUCTION IN PHOTORESIST COMPOSITIONS BY CHELATING ION EXCHANGE RESIN
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Patent #:
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Issue Dt:
|
12/29/1998
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Application #:
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08576748
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Filing Dt:
|
12/21/1995
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Title:
|
POSITIVE PHOTORESIST UTILIZING MIXED SOLVENT CONSISTIING ESSENTIALLY OF 3-METHYL-3-METHOXY BUTANOL AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
|
09/09/1997
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Application #:
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08587874
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Filing Dt:
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01/11/1996
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Title:
|
ACIDIC ION EXCHANGE RESIN AS A CATALYST TO SYNTHESIZE A NOVOLAK RESIN AND PHOTORESIST COMPOSITION THEREFROM
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|
