Patent Assignment Details
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| Reel/Frame: | 009154/0001 | |
| Pages: | 3 |
| | Recorded: | 04/23/1998 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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02/02/1999
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Application #:
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08939216
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Filing Dt:
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09/29/1997
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Title:
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TECHNIQUES FOR ETCHING A SILICON DIOXIDE-CONTAINING LAYER
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Assignee
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| 10950 NORTH TANTAU AVENUE |
| CUPERTINO, CALIFORNIA 95014 |
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Correspondence name and address
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SIEMENS CORPORATION
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ELSA KELLER
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INTELLECTUAL PROPERTY DEPARTMENT
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186 WOOD AVENUE SOUTH
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ISELIN, NEW JERSEY 08830
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