Patent Assignment Details
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| Reel/Frame: | 010285/0889 | |
| Pages: | 6 |
| | Recorded: | 01/05/1999 | | |
| Conveyance: | (ASSIGNMENT OF ASSIGNOR'S INTEREST) RE-RECORD TO CORRECT THE RECORDATION DATE OF 4/29/99 TO 1/5/99, PREVIOUSLY RECORDED AT REEL 9921, FRAME 0274. |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/08/2001
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Application #:
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09225661
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Filing Dt:
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01/05/1999
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Title:
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METHOD FOR FORMING SEMICONDUCTOR SEED LAYERS BY INERT GAS SPUTTER ETCHING
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Assignee
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| P.O. BOX 3453 |
| ONE AMD PLACE |
| SUNNYVALE, CALIFORNIA 94088 |
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Correspondence name and address
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THE LAW OFFICES OF MIKIO ISHIMARU
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MIKIO ISHIMARU
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1046 PINENUT COURT
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SUNNYVALE, CA 94087
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