Patent Assignment Details
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Reel/Frame: | 010483/0452 | |
| Pages: | 2 |
| | Recorded: | 12/22/1999 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/07/2001
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Application #:
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09469760
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Filing Dt:
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12/22/1999
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Title:
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PROCESS FOR FABRICATING A METAL SILICIDE LAYER OF A SEMICONDUCTOR AND APPARATUS THEREOF.
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Assignee
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7-1, SHIBA 5-CHOME MINATO-KU |
TOKYO, JAPAN |
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Correspondence name and address
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HELGOTT & KARAS, P.C.
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SAMSON HELFGOTT
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EMPIRE STATE BUILDING, 60TH FLOOR
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350 5TH AVENUE, SUITE 6024
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NEW YORK NY 10118
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