Patent Assignment Details
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| Reel/Frame: | 010629/0268 | |
| Pages: | 3 |
| | Recorded: | 03/15/2000 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/22/2003
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Application #:
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09526295
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Filing Dt:
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03/15/2000
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Title:
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DEVELOPER AND METHOD FOR FORMING RESIST PATTERN AND PHOTOMASK PRODUCED BY USE THEREOF
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Assignee
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| NAKAHARA-KU, KAWASAKI-SHI |
| 1-1, KAMIKODANAKA 4-CHOME |
| KANAGAWA 211-8588, JAPAN |
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Correspondence name and address
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ARMSTRONG, WESTERMAN, HATTORI ET AL.
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STEPHEN G. ADRIAN
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1725 K STREET, NW
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SUITE 1000
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WASHINGTON, DC 20006
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