Patent Assignment Details
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Reel/Frame: | 010733/0477 | |
| Pages: | 3 |
| | Recorded: | 03/31/2000 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/21/2001
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Application #:
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09540552
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Filing Dt:
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03/31/2000
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Title:
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Multilayered wafer with thick sacrificial layer using porous silicon or porous silicon oxide and fabrication method thereof
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Assignee
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416 MAETAN-DONG, PALDAL-GU |
SUWON-CITY, KYUNGKI-DO, KOREA, REPUBLIC OF |
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Correspondence name and address
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BURNS, DOANE, SWECKER & MATHIS, LLP
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CHARLES F. WIELAND III
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P.O. BOX 1404
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ALEXANDRIA, VA 22313-1404
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