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Patent Assignment Details
NOTE:Results display only for issued patents and published applications. For pending or abandoned applications please consult USPTO staff.

Reel/Frame:011397/0417   Pages: 12
Recorded: 12/28/2000
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 23
1
Patent #:
Issue Dt:
05/30/2000
Application #:
08891468
Filing Dt:
07/11/1997
Title:
COMPOSITION AND SLURRY USEFUL FOR METAL CMP
2
Patent #:
Issue Dt:
10/03/2000
Application #:
08891649
Filing Dt:
07/11/1997
Title:
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES
3
Patent #:
Issue Dt:
07/04/2000
Application #:
08901803
Filing Dt:
07/28/1997
Title:
POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING
4
Patent #:
Issue Dt:
10/30/2001
Application #:
08944036
Filing Dt:
09/29/1997
Title:
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES
5
Patent #:
Issue Dt:
02/10/2004
Application #:
08994894
Filing Dt:
12/19/1997
Title:
COMPOSITION FOR OXIDE CMP
6
Patent #:
Issue Dt:
08/13/2002
Application #:
09040630
Filing Dt:
03/18/1998
Publication #:
Pub Dt:
12/13/2001
Title:
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES
7
Patent #:
Issue Dt:
05/16/2000
Application #:
09062327
Filing Dt:
04/17/1998
Title:
POLISHING PAD FOR A SEMICONDUCTOR SUBSTRATE
8
Patent #:
Issue Dt:
01/23/2001
Application #:
09084630
Filing Dt:
05/26/1998
Title:
CMP SLURRY CONTAINING A SOLID CATALYST
9
Patent #:
Issue Dt:
10/24/2000
Application #:
09086659
Filing Dt:
05/29/1998
Title:
POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING
10
Patent #:
Issue Dt:
03/18/2003
Application #:
09105060
Filing Dt:
06/26/1998
Publication #:
Pub Dt:
03/21/2002
Title:
CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD FOR USING SAME
11
Patent #:
Issue Dt:
04/17/2001
Application #:
09105065
Filing Dt:
06/26/1998
Title:
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER/TANTALUM SUBSTRATES
12
Patent #:
Issue Dt:
05/16/2000
Application #:
09105555
Filing Dt:
06/26/1998
Title:
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER/TANTALUM SUBSTRATE
13
Patent #:
Issue Dt:
09/12/2000
Application #:
09113248
Filing Dt:
07/10/1998
Title:
POLISHING PAD FOR A SEMICONDUCTOR SUBSTRATE
14
Patent #:
Issue Dt:
10/03/2000
Application #:
09114003
Filing Dt:
07/10/1998
Title:
POLISHING PADS FOR A SEMICONDUCTOR SUBSTRATE
15
Patent #:
Issue Dt:
07/15/2003
Application #:
09366588
Filing Dt:
08/04/1999
Publication #:
Pub Dt:
03/21/2002
Title:
CHEMICAL MECHANICAL POLISHING METHOD USEFUL FOR COPPER SUBSTRATES
16
Patent #:
Issue Dt:
05/28/2002
Application #:
09405249
Filing Dt:
09/27/1999
Title:
CLEANING SOLUTION FOR SEMICONDUCTOR SURFACES FOLLOWING CHEMICAL-MECHANICAL POLISHING
17
Patent #:
Issue Dt:
02/19/2002
Application #:
09425473
Filing Dt:
10/22/1999
Title:
COMPOSITION AND METHOD FOR POLISHING RIGID DISKS
18
Patent #:
Issue Dt:
02/26/2002
Application #:
09428965
Filing Dt:
11/04/1999
Publication #:
Pub Dt:
12/13/2001
Title:
USE OF CSOH IN A DIELECTRIC CMP SLURRY
19
Patent #:
Issue Dt:
09/25/2001
Application #:
09440401
Filing Dt:
11/15/1999
Title:
COMPOSITION AND METHOD FOR PLANARIZING SURFACES
20
Patent #:
Issue Dt:
11/20/2001
Application #:
09440525
Filing Dt:
11/15/1999
Title:
COMPOSITION AND METHOD FOR PLANARIZING SURFACES
21
Patent #:
Issue Dt:
03/26/2002
Application #:
09501221
Filing Dt:
02/10/2000
Title:
Method for Polishing a Substrate Using a CMP Slurry
22
Patent #:
Issue Dt:
11/13/2001
Application #:
09503996
Filing Dt:
02/14/2000
Title:
Method of polishing using multi-oxidizer slurry
23
Patent #:
NONE
Issue Dt:
Application #:
09504058
Filing Dt:
02/14/2000
Publication #:
Pub Dt:
12/26/2002
Title:
Method of polishing a substrate
Assignor
1
Exec Dt:
03/27/2000
Assignee
1
A CORPORATION OF DELAWARE
870 N. COMMONS DRIVE
AURORA, ILLINOIS 60504
Correspondence name and address
CABOT CORPORATION
MICHELLE B. LANDO
157 CONCORD ROAD
BILLERICA, MASSACHUSETTS 01821
Domestic representative
CABOT CORPORATION
MICHELLE B. LANDO
157 CONCORD ROAD
BILLERICA, MASSACHUSETTS 01821

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