Patent Assignment Details
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| Reel/Frame: | 011760/0520 | |
| Pages: | 2 |
| | Recorded: | 05/01/2001 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/01/2003
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Application #:
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09760667
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Filing Dt:
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01/17/2001
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Publication #:
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Pub Dt:
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09/27/2001
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Title:
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PLASMA DENSITY MEASURING METHOD AND APPARATUS, AND PLASMA PROCESSING SYSTEM USING THE SAME
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Assignee
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| 30-2, SHIMOMARUKO 3-CHOME, OHTA-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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FITZPATRICK, CELLA, HARPER & SCINTO
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SHAWN W. FRASER
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30 ROCKEFELLER PLAZA
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NEW YORK, NEW YORK 10112-3801
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