Patent Assignment Details
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Reel/Frame: | 011766/0458 | |
| Pages: | 2 |
| | Recorded: | 04/30/2001 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/13/2003
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Application #:
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09843693
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Filing Dt:
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04/30/2001
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Publication #:
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Pub Dt:
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06/20/2002
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Title:
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PHOTO MASK TO BE USED FOR PHOTOLITHOGRAPHY, METHOD OF INSPECTING PATTERN DEFECT, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE THROUGH USE OF THE MASK
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Assignee
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CHIYODA-KU |
2-3, MARUNOUCHI 2-CHOME |
TOKYO 100-8310, JAPAN |
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Correspondence name and address
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MCDERMOTT, WILL & EMERY
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STEPHEN A. BECKER
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600 13TH ST, N.W.
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WASHINGTON, DC 20005
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