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Patent Assignment Details
NOTE:Results display only for issued patents and published applications. For pending or abandoned applications please consult USPTO staff.

Reel/Frame:012530/0418   Pages: 15
Recorded: 02/06/2002
Conveyance: SECURITY INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 9
1
Patent #:
Issue Dt:
01/12/1999
Application #:
08724967
Filing Dt:
10/03/1996
Title:
SELECTIVE PLASMA DEPOSITION
2
Patent #:
Issue Dt:
10/05/1999
Application #:
08759868
Filing Dt:
12/03/1996
Title:
METHODS FOR MINIMIZING AS-DEPOSITED STRESS IN TUNGSTEN SILICIDE FIRMS
3
Patent #:
Issue Dt:
01/05/1999
Application #:
08810255
Filing Dt:
03/03/1997
Title:
MULTIPURPOSE PROCESSING CHAMBER FOR CHEMICAL VAPOR DEPOSITION PROCESSES
4
Patent #:
Issue Dt:
03/09/1999
Application #:
08920708
Filing Dt:
08/29/1997
Title:
VERTICALLY-STACKED PROCESS REACTOR AND CLUSTER TOOL SYSTEM FOR ATOMIC LAYER DEPOSITION
5
Patent #:
Issue Dt:
01/16/2001
Application #:
09225081
Filing Dt:
01/04/1999
Title:
PROCESSING CHAMBER FOR ATOMIC LAYER DEPOSITION PROCESSES
6
Patent #:
Issue Dt:
03/13/2001
Application #:
09267953
Filing Dt:
03/11/1999
Title:
RADICAL-ASSISTED SEQUENTIAL CVD
7
Patent #:
Issue Dt:
03/27/2001
Application #:
09285698
Filing Dt:
04/05/1999
Title:
GOLF BALL HAVING ELONGATED DIMPLES AND METHOD FOR MAKING THE SAME
8
Patent #:
Issue Dt:
10/10/2000
Application #:
09365988
Filing Dt:
08/03/1999
Title:
APPARATUS AND METHODS FOR MINIMIZING AS-DEPOSITED STRESS IN TUNGSTEN SILICIDE FILMS
9
Patent #:
Issue Dt:
09/04/2001
Application #:
09769634
Filing Dt:
01/24/2001
Publication #:
Pub Dt:
06/07/2001
Title:
Method for providing uniform gas delivery to substrates in CVD and PECVD processes
Assignor
1
Exec Dt:
12/20/2001
Assignee
1
3003 TASMAN DRIVE
SANTA CLARA, CALIFORNIA 95054
Correspondence name and address
LEVY, SMALL & LALLAS
SEBASTIAN CAMUA
815 MORAGA DRIVE
LOS ANGELES CA 90049

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