Patent Assignment Details
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Reel/Frame: | 013365/0534 | |
| Pages: | 3 |
| | Recorded: | 10/02/2002 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/27/2003
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Application #:
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10262926
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Filing Dt:
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10/02/2002
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Title:
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INTEGRATED PROCESS SEQUENCE ALLOWING ELIMINATION OF POLYSILICON RESIDUE AND SILICON DAMAGE DURING THE FABRICATION OF A BURIED STACK CAPACITOR STRUCTURE IN A SRAM CELL
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Assignee
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121 PARK AVE. 3 |
SCIENCE-BASED INDUSTRIAL PARK |
HSIN-CHU, TAIWAN R.O.C. |
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Correspondence name and address
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GEORGE O. SAILE
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28 DAVIS AVENUE
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POUGHKEEPSIE, NY 12603
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