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Patent Assignment Details
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Reel/Frame:014016/0983   Pages: 4
Recorded: 09/30/2003
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 6
1
Patent #:
Issue Dt:
11/14/2006
Application #:
10249317
Filing Dt:
03/31/2003
Publication #:
Pub Dt:
09/30/2004
Title:
LAYOUT IMPACT REDUCTION WITH ANGLED PHASE SHAPES
2
Patent #:
Issue Dt:
06/14/2005
Application #:
10249771
Filing Dt:
05/06/2003
Publication #:
Pub Dt:
11/11/2004
Title:
STRUCTURE AND METHOD OF FORMING A NOTCHED GATE FIELD EFFECT TRANSISTOR
3
Patent #:
Issue Dt:
12/07/2004
Application #:
10249800
Filing Dt:
05/08/2003
Publication #:
Pub Dt:
11/11/2004
Title:
DUAL GATE MATERIAL PROCESS FOR CMOS TECHNOLOGIES
4
Patent #:
Issue Dt:
03/09/2004
Application #:
10250201
Filing Dt:
06/12/2003
Title:
ERROR DETECTION AND CORRECTION METHOD AND APPARATUS IN A MAGNETORESISTIVE RANDOM ACCESS MEMORY
5
Patent #:
Issue Dt:
08/16/2005
Application #:
10289075
Filing Dt:
11/06/2002
Publication #:
Pub Dt:
05/06/2004
Title:
USING ISOLATED P-WELL TRANSISTOR ARRANGEMENTS TO AVOID LEAKAGE CAUSED BY WORD LINE/BIT LINE SHORTS
6
Patent #:
Issue Dt:
02/01/2005
Application #:
10376461
Filing Dt:
02/28/2003
Publication #:
Pub Dt:
09/02/2004
Title:
SELECTIVE SILICIDATION SCHEME FOR MEMORY DEVICES
Assignor
1
Exec Dt:
09/29/2003
Assignee
1
ST. MARTIN-STR. 53
81669 MUNICH, GERMANY
Correspondence name and address
SIEMENS CORPORATION
ELSA KELLER
186 WOOD AVENUE SOUTH
INTELLECTUAL PROPERTY DEPARTMENT
ISELIN, NJ 08830

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