Patent Assignment Details
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| Reel/Frame: | 014039/0956 | |
| Pages: | 3 |
| | Recorded: | 05/01/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/12/2006
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Application #:
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10428688
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Filing Dt:
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05/01/2003
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Publication #:
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Pub Dt:
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11/04/2004
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Title:
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EUV REFLECTION MASK AND LITHOGRAPHIC PROCESS USING THE SAME
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Assignee
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| NO. 3, LI-HSIN RD. II |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN R.O.C. |
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Correspondence name and address
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J. C. PATENTS, INC.
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JIAWEI HUANG
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4 VENTURE, SUITE 250
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IRVINE, CA 92618
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