Patent Assignment Details
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| Reel/Frame: | 014341/0219 | |
| Pages: | 2 |
| | Recorded: | 07/30/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/13/2006
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Application #:
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10414257
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Filing Dt:
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04/15/2003
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Publication #:
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Pub Dt:
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04/29/2004
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Title:
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NOVOLAK RESIN SOLUTION, POSITIVE PHOTORESIST COMPOSITION AND PREPARATION METHOD THEREOF
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU |
| KAWASAKI-SHI KANAGAWA-KEN, JAPAN |
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Correspondence name and address
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HOFFMANN & BARON
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CHARLES R. HOFFMAN
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6900 JERICHO TURNPIKE
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SYOSSET, NY 11791
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