Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 014557/0147 | |
| Pages: | 4 |
| | Recorded: | 04/23/2004 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
3
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Patent #:
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Issue Dt:
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10/16/2001
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Application #:
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08975087
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Filing Dt:
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11/20/1997
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Title:
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LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING BISMUTH-CONTAINING CERAMIC FILMS USEFUL IN FERROELECTRIC MEMORY DEVICES
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Patent #:
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Issue Dt:
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09/07/2004
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Application #:
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09210912
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Filing Dt:
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12/14/1998
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Title:
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METHOD OF CONTROLLED CHEMICAL VAPOR DEPOSITION OF A METAL OXIDE CERAMIC LAYER
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Patent #:
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Issue Dt:
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05/04/2004
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Application #:
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09873138
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Filing Dt:
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06/01/2001
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Publication #:
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Pub Dt:
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11/15/2001
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Title:
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LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING BISMUTH-CONTAINING CERAMIC THIN FILMS USEFUL IN FERROELECTRIC MEMORY DEVICES
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Assignee
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| ST. - MARTIN-STR. 53 |
| 81669 MUNCHEN, GERMANY |
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Correspondence name and address
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INFINEON TECHNOLOGIES NORTH AMERICA CORP
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HEATHER ROWLAND
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IFNA CPC IC
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3000 CENTREGREEN WAY
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CARY, NC 27513
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