Patent Assignment Details
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| Reel/Frame: | 014638/0264 | |
| Pages: | 4 |
| | Recorded: | 10/22/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/02/2006
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Application #:
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10689666
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Filing Dt:
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10/22/2003
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Publication #:
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Pub Dt:
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05/06/2004
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Title:
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PHOTOMASK DEFECT TESTING METHOD, PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR INTEGRATED CIRCUIT MANUFACTURING METHOD
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Assignees
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| 22-22, NAGAIKE-CHO, ABENO-KU, OSAKA-SHI |
| OSAKA, JAPAN 545-8522 |
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| 5-1, TAITO 1-CHOME, TAITO-KU |
| TOKYO, JAPAN 110-8560 |
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Correspondence name and address
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NIXON & VANDERHYE, P.C.
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H. WARREN BURNAM, JR.
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1100 NORTH GLEBE ROAD
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8TH FLOOR
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ARLINGTON, VA 22201
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