Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 014642/0015 | |
| Pages: | 3 |
| | Recorded: | 10/29/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/12/2006
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Application #:
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10607496
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Filing Dt:
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06/26/2003
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Publication #:
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Pub Dt:
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12/30/2004
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Title:
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COBALT/NICKEL BI-LAYER SILICIDE PROCESS FOR VERY NARROW LINE POLYSILICON GATE TECHNOLOGY
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Assignee
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| NO. 8, LI-HSIN ROAD 6 |
| SCIENCE BASED INDUSTRIAL PARK |
| HSIN-CHU, TAIWAN 300-77 R.O.C. |
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Correspondence name and address
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DUANE MORRIS LLP
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WILLIAM H. MURRAY
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ONE LIBERTY PLACE
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PHILADELPHIA, PA 19103
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