Patent Assignment Details
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| Reel/Frame: | 014710/0645 | |
| Pages: | 3 |
| | Recorded: | 11/17/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10714773
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Filing Dt:
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11/17/2003
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Publication #:
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Pub Dt:
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06/03/2004
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Title:
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Forming method of resist pattern for improving accuracy of dimension of pattern, manufacturing method of semiconductor apparatus using the same and heat treatment apparatus for the same
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Assignee
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| 2-1, YAESU 2-CHOME |
| CHUO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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HAYES SOLOWAY P.C.
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NORMAN P. SOLOWAY
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130 W. CUSHING STREET
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TUSCON, AZ 85701
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