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Total properties:
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07/30/1996
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08046728
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04/16/1993
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06/11/1996
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08196810
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02/15/1994
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Title:
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01/21/1997
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08390045
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02/17/1995
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Title:
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RADIATION SENSITIVE COMPOSITION
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09/02/1997
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08420787
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04/12/1995
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RADIATION-SENSITIVE MIXTURE COMPRISING A BASIC IODONIUM COMPOUND
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06/24/1997
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08507301
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08/25/1995
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03/16/1999
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08557841
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11/14/1995
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Title:
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11/25/1997
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08623735
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03/29/1996
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Title:
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PATTERN FORMING MATERIAL INCLUDING PHOTOACID AND PHOTOBASE GENERATORS FOR LARGE EXPOSURE LATITUDE
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06/30/1998
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08685850
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07/24/1996
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Title:
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RADIATION-SENSITIVE COMPOSITION
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08/03/1999
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08783008
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Filing Dt:
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01/14/1997
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POLYBENZIMIDAZOLE MATERIAL WITH LOW METALLIC CONCENTRATION AND A PROCESS FOR PRODUCTION THEREOF
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12/29/1998
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08838665
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04/09/1997
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08/29/2000
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08860451
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06/26/1997
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Title:
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RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM USING THE SAME
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04/14/1998
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08864375
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05/28/1997
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Title:
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RADIATION SENSITIVE COMPOSITION
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Patent #:
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06/23/1998
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08874860
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06/13/1997
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PROCESS FOR MANUFACTURING SINTERED POLYBENZIMIDAZOLE ARTICLE
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05/11/1999
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08877851
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06/18/1997
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POLYBENZIMIDAZOLE COMPOUNDS IN SOLUTION AND A PROCESS FOR THE PREPARATION THEREOF
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12/01/1998
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08902072
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07/29/1997
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Title:
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POSITIVE-WORKING RADIATION-SENSITIVE MIXTURE
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Patent #:
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12/22/1998
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08922321
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09/03/1997
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Title:
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NEW ACID-LABILE GROUP PROTECTED HYDROXYSTYRENE POLYMERS OR COPOLYMERS THEREOF AND THEIR APPLICATION TO RADIATION SENSITIVE MATERIALS
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10/05/1999
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08955453
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10/21/1997
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RADIATION SENSITIVE COMPOSITION
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Patent #:
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10/12/1999
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08996510
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12/23/1997
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02/06/2001
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09079565
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05/15/1998
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10/12/2004
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09237125
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01/26/1999
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05/27/2003
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02/23/1999
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06/27/2000
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09242942
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02/26/1999
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10/22/2002
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02/04/1999
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Title:
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RADIATION ABSORBING POLYMER, COMPOSITION FOR RADIATION ABSORBING COATING, RADIATION ABSORBING COATING AND APPLICATION THEREOF AS ANTI-REFLECTIVE COATING
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09/04/2001
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08/05/1999
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12/11/2001
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09319129
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08/09/1999
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ANTIREFLECTION OR LIGHT-ABSORBING COATING COMPOSITION AND POLYMER THEREFOR
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02/19/2002
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07/01/1999
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CLEANING METHOD OF CONTAINERS AND APPARATUS THEREOF
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07/03/2001
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09424128
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03/23/2000
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LIGHT-ABSORBING POLYMERS AND APPLICATION THEREOF TO ANTIREFLECTION FILM
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11/12/2002
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09445345
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04/03/2000
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11/01/2001
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10/15/2002
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05/23/2000
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03/19/2002
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09529371
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07/03/2000
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RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
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02/04/2003
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09555393
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08/01/2000
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04/30/2002
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09582010
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06/20/2000
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01/29/2002
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10/12/2000
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10/15/2002
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09600612
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07/17/2000
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METHOD FOR FORMING RESIST PATTERN
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04/16/2002
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09623119
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11/15/2000
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PHOTOSENSITIVE RESIN COMPOSITION
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03/25/2003
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09673547
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10/13/2000
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PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A FLUORESCENT MATERIAL
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05/07/2002
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12/01/2000
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RADIATION-SENSITIVE RESIN COMPOSITION
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04/29/2003
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09786245
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02/28/2001
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WATER-SOLUBLE RESIN COMPOSITION
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02/03/2004
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09824198
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04/02/2001
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09/27/2001
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NOVEL PROCESS FOR PREPARING RESISTS
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05/18/2004
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09857553
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06/05/2001
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PHOTOSENSITIVE COMPOSITION
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02/17/2004
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07/10/2001
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08/05/2003
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08/27/2001
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12/05/2002
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COATING COMPOSITION
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09/09/2003
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10/17/2001
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03/07/2002
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CLEANING METHOD OF CONTAINERS AND APPARATUS THEREOF
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04/06/2004
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12/06/2001
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08/22/2002
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RADIATION-SENSITIVE RESIN COMPOSITION
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07/15/2003
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11/09/2001
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02/06/2003
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METHOD FOR PRODUCING POLYBENZIMIDAZOLE SINTERED COMPACT
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NONE
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08/13/2002
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05/15/2003
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Aqueous surfactant solution for developing coating film layer
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06/07/2005
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08/28/2002
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06/19/2003
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PHOTOSENSITIVE PLOYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF
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10/19/2004
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08/08/2002
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01/30/2003
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HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN
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05/16/2006
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08/29/2002
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01/30/2003
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05/18/2004
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08/27/2002
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04/03/2003
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09/06/2005
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08/30/2002
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02/06/2003
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07/27/2004
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10/23/2002
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03/27/2007
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12/18/2002
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09/25/2003
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08/23/2005
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12/18/2002
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06/12/2003
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06/08/2004
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02/24/2003
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08/14/2003
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05/24/2005
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04/04/2003
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02/05/2004
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09/20/2005
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02/12/2004
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03/28/2006
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05/08/2003
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03/18/2004
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05/21/2003
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03/04/2004
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05/24/2005
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05/22/2003
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02/12/2004
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06/09/2003
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02/19/2004
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Chemical-amplication-type positive radiation-sensitive resin composition
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12/08/2003
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09/02/2004
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11/28/2006
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02/23/2004
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12/02/2004
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06/09/2004
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01/27/2005
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Optical film having controlled scattering/ transmitting characteristics and liquid crystal display using it
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03/18/2008
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Application #:
|
10499374
|
Filing Dt:
|
06/16/2004
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|
Publication #:
|
|
Pub Dt:
|
02/03/2005
| | | | |
|
Title:
|
SOLVENT FOR TREATING POLYSILAZANE AND METHOD OF TREATING POLYSILAZANE WITH THE SOLVENT
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/06/2007
|
Application #:
|
10500752
|
Filing Dt:
|
07/01/2004
|
|
Publication #:
|
|
Pub Dt:
|
06/02/2005
| | | | |
|
Title:
|
CLEANING AGENT COMPOSITION FOR A POSITIVE OR A NEGATIVE PHOTORESIST
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10504226
|
Filing Dt:
|
08/10/2004
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|
Publication #:
|
|
Pub Dt:
|
04/14/2005
| | | | |
|
Title:
|
Photosensitve resin composition
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/10/2007
|
Application #:
|
10506885
|
Filing Dt:
|
09/07/2004
|
|
Publication #:
|
|
Pub Dt:
|
08/04/2005
| | | | |
|
Title:
|
ACTIVE BACKSCATTER TRANSPONDER, COMMUNICATION SYSTEM COMPRISING THE SAME AND METHOD FOR TRANSMITTING DATA BY WAY OF SUCH AN ACTIVE BACKSCATTER TRANSPONDER
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10608392
|
Filing Dt:
|
06/27/2003
|
|
Publication #:
|
|
Pub Dt:
|
06/03/2004
| | | | |
|
Title:
|
Coating composition
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/26/2006
|
Application #:
|
10688541
|
Filing Dt:
|
10/17/2003
|
|
Publication #:
|
|
Pub Dt:
|
05/06/2004
| | | | |
|
Title:
|
OPTICAL FILM HAVING CONTROLLED SCATTERING/TRANSMITTING CHARACTERISTICS
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10909718
|
Filing Dt:
|
08/02/2004
|
|
Publication #:
|
|
Pub Dt:
|
01/06/2005
| | | | |
|
Title:
|
Negative photosensitive resin composition and display device using the same
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|
