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Patent #:
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Issue Dt:
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10/29/1985
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Application #:
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06619468
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Filing Dt:
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06/11/1984
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Title:
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POSITIVE PHOTORESIST COMPOSITIONS WITH O-QUINONE DIAZIDE, NOVOLAK, AND PTLOPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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06/24/1986
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Application #:
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06655824
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Filing Dt:
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10/01/1984
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Title:
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POSITIVE PHOTORESIST PROCESSING WITH MID U-V RANGE EXPOSURE
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Patent #:
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Issue Dt:
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01/19/1988
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Application #:
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06829874
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Filing Dt:
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02/18/1986
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Title:
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COPOLYMERS FROM MALEIMIDE AND ALIPHATIC VINYL ETHERS AND ESTERS USED IN POSITIVE PHOTORESIST
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Patent #:
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Issue Dt:
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03/22/1988
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Application #:
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06858631
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Filing Dt:
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05/02/1986
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Title:
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NOVEL MIXED ESTER O-QUINONE PHOTOSENSITIZERS
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Patent #:
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Issue Dt:
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12/05/1989
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Application #:
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06921879
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Filing Dt:
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10/17/1986
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Title:
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HIGH TEMPERATURE POST EXPOSURE BAKING TREATMENT FOR POSITIVE PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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08/15/1989
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Application #:
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07024875
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Filing Dt:
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03/17/1987
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Title:
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POSITIVE PHOTORESIST THERMALLY STABLE COMPOSITIONS AND ELEMENTS HAVING DEEP UV RESPONSE WITH MALEIMIDE COPOLYMER
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Patent #:
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Issue Dt:
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02/28/1989
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Application #:
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07035413
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Filing Dt:
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04/06/1987
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Title:
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METHOD OF DEVELOPING A HIGH CONTRAST,POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING ALKANOLAMINE
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Patent #:
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Issue Dt:
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03/07/1989
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Application #:
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07052950
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Filing Dt:
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05/22/1987
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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Patent #:
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Issue Dt:
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02/21/1989
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Application #:
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07064969
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Filing Dt:
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08/27/1987
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Title:
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COMPOSITION CONTAINING A MIXTURE OF HEXA-ALKYL DISILAZANE AND PROPYLENE GLYCOL ALKYL ETHER AND/OR PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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05/22/1990
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Application #:
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07076098
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Filing Dt:
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07/21/1987
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Title:
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HYDROXY POLYIMIDES AND HIGH TEMPERATURE POSITIVE PHOTORESISTS THEREFROM
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Patent #:
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Issue Dt:
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07/04/1989
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Application #:
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07124634
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Filing Dt:
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11/24/1987
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Title:
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HEAT RESISTANT POLYAMIDES AND POLYBENZOXAZOLES FROM BIS-((AMINO- HYDROXYPHENYL)HEXAFLUOROISOPROPYL)DIPHENYL ETHERS
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Patent #:
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Issue Dt:
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02/07/1989
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Application #:
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07124742
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Filing Dt:
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11/24/1987
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Title:
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PHOTOSENSITIVE POLYIMIDE POLYMER COMPOSITIONS
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Patent #:
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Issue Dt:
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02/20/1990
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Application #:
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07140447
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Filing Dt:
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12/28/1987
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Title:
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1,3 DISUBSTITUTED-5-DIAZOBARBITURIC ACIDS
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Patent #:
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Issue Dt:
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04/14/1992
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Application #:
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07167068
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Filing Dt:
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03/11/1988
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Title:
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POSITIVE-WORKING PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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01/09/1990
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Application #:
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07170534
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Filing Dt:
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03/21/1988
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Title:
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MIXED ESTER O-QUINONE DIAZIDE PHOTOSENSITIZERS PROCESS OF PREPARATION
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Patent #:
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Issue Dt:
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10/10/1989
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Application #:
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07219695
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Filing Dt:
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07/18/1988
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Title:
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PROTECTIVE COATINGS OF A CURED HYDROXYSTYRENE MANNICH BASE AND BLOCKED POLYISOCYANATES
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Patent #:
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Issue Dt:
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10/31/1989
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Application #:
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07219697
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Filing Dt:
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07/18/1988
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Title:
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POLY(EPOXIDE) COATINGS CONTAINING A MANNICH BASE OF A HYDROXYSTYRENE CONTAINING POLYMER
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Patent #:
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Issue Dt:
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09/19/1989
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Application #:
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07226258
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Filing Dt:
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08/02/1988
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Title:
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PROCESS FOR THE PRODUCTION OF 3-MONO OR 3,5, DISUBSTITUTED-4- ACETOXYSTYRENE ITS POLYMERIZATION, AND HYDROLYSIS
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Patent #:
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Issue Dt:
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04/24/1990
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Application #:
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07227404
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Filing Dt:
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08/02/1988
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Title:
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HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS WITH MIXED CRESOL AND HYDROXYBENZALDEHYDE PREPARED NOVOLAK AND PHOTOSENSITIVE DIAZOQUINONE
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Patent #:
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Issue Dt:
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05/29/1990
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Application #:
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07268639
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Filing Dt:
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11/08/1988
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-NAPHTHOQUINONE DIAZIDE AND CROSS- LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING
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Patent #:
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Issue Dt:
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06/05/1990
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Application #:
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07268640
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Filing Dt:
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11/08/1988
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING TREATMENT
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Patent #:
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Issue Dt:
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10/09/1990
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Application #:
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07289592
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Filing Dt:
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12/22/1988
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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Patent #:
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Issue Dt:
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09/19/1989
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Application #:
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07312170
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Filing Dt:
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02/21/1989
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Title:
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PROCESS FOR THE PRODUCTION OF 3-MONO OR 3,5 DISUBSTITUTED-4- ACETOXYSTYRENE, ITS POLYMERIZATION
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Patent #:
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Issue Dt:
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12/25/1990
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Application #:
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07321021
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Filing Dt:
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03/09/1989
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Title:
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POLYAMIDE-POLYIMIDE AND POLYBENZOXAZOLE-POLYIMIDE POLYMER
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Patent #:
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Issue Dt:
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01/08/1991
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Application #:
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07352618
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Filing Dt:
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05/15/1989
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Title:
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PHOTORESIST TREATING COMPOSITION CONSISTING OF A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GYLCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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08/06/1991
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Application #:
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07363245
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Filing Dt:
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06/08/1989
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Title:
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HYDROXLATED AROMATIC POLYAMIDE POLYMER CONTAINING BOUND NAPHTHOQUINONE DIAZIDE PHOTOSENSITIZER,METHOD OF MAKING AND USE
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Patent #:
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Issue Dt:
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10/22/1991
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Application #:
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07366088
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Filing Dt:
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06/14/1989
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Title:
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PHOTOCHEMICAL IMAGE PROCESS OF POSITIVE PHOTORESIST ELEMENT WITH MALEIMIDE COPOLYMER
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Patent #:
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Issue Dt:
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08/13/1991
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Application #:
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07373358
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Filing Dt:
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06/29/1989
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Title:
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DEEP U.V. PHOTORESIST COMPOSITIONS CONTAINING POLYCYCLIC CYCLOPENTANE -2- DIAZO-1,3-DIONE
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Patent #:
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Issue Dt:
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08/14/1990
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Application #:
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07376147
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Filing Dt:
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07/05/1989
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Title:
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POSITIVE O-QUINONE DIAZIDE PHOTORESIST WITH A SOLVENT MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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06/04/1991
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Application #:
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07376684
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Filing Dt:
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07/07/1989
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Title:
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POLYAMIDE CONTAINING THE HEXAFLUOROISOPROPYLIDENE GROUP WITH O-QUINONE DIAZIDE IN POSITIVE WORKING PHOTORESIST
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Patent #:
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Issue Dt:
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07/24/1990
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Application #:
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07376971
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Filing Dt:
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07/06/1989
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Title:
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HIGH SENSITIVITY MID AND DEEP UV RESIST
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Patent #:
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Issue Dt:
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04/21/1992
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Application #:
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07405493
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Filing Dt:
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09/11/1989
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Title:
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BASE DEVELOPABLE NEGATIVE ACTING PHOTORESISTS
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Patent #:
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Issue Dt:
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03/05/1991
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Application #:
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07454409
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Filing Dt:
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12/21/1989
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Title:
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METHOD OF FORMING A THERMALLY STABLE MIXED ALDEHYDE NOVOLAK RESIN CONTAINING RESIST PATTERN AND THAT PATTERN ON A SUBSTRATE
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Patent #:
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Issue Dt:
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01/26/1993
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Application #:
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07475402
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Filing Dt:
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02/05/1990
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Title:
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NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM
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Patent #:
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Issue Dt:
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04/30/1991
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Application #:
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07476332
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Filing Dt:
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02/07/1990
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Title:
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PHOTORESIST COMPOSITIONS CONTAINING POLYAMIDES FROM BIS(AMINOHYDROXYY- PHENYL) HEXAFLUOROISOPROPYL) DIPHENYL ETHERS
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Patent #:
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Issue Dt:
|
02/26/1991
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Application #:
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07496240
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Filing Dt:
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03/20/1990
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Title:
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METHOD OF FORMING RESIST PATTERN AND THERMALLY STABLE AND HIGHLY RESOLVED RESIST PATTERN
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Patent #:
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Issue Dt:
|
11/19/1991
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Application #:
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07501970
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Filing Dt:
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03/28/1990
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|
Title:
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METHOD FOR PRODUCING AND USING A POSITIVE PHOTORESIST WITH O-QUINONE DIAZIDE, NOVOLAK, AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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11/26/1991
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Application #:
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07502075
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Filing Dt:
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03/29/1990
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Title:
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BIZ-DIAZOTIZED DIARYL DIAMINE COUPLED DYES HAVING IMPROVED SOLUBILITY IN ORGANIC SOLVENT
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Patent #:
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Issue Dt:
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12/31/1991
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Application #:
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07526583
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Filing Dt:
|
05/21/1990
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|
Title:
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POLYAMIDE CONTAINING THE HEXAFLUOROISOPROPYLIDENE GROUP
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|
|
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Patent #:
|
|
Issue Dt:
|
06/08/1993
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Application #:
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07530545
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Filing Dt:
|
05/25/1990
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Title:
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IMAGE REVERSAL NEGATIVE WORKING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING TREAT- MENT AND ELEMENT PRODUCED THEREFROM
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Patent #:
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Issue Dt:
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08/13/1991
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Application #:
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07533966
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Filing Dt:
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06/06/1990
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Title:
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POSITIVE PHOTORESIST CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHERS AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
|
01/14/1992
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Application #:
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07543321
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Filing Dt:
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06/25/1990
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Title:
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BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
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|
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Patent #:
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|
Issue Dt:
|
12/17/1991
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Application #:
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07550692
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Filing Dt:
|
07/10/1990
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Title:
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PROCESS FOR THE PREPARATION OF NOVOLAK RESINS WITH LOW METAL ION CONTENT
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|
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Patent #:
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|
Issue Dt:
|
12/10/1991
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Application #:
|
07558739
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Filing Dt:
|
07/26/1990
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|
Title:
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POLYAMIDE-POLYIMIDE AND POLYBENZOXAZOLE-POLYIMIDE POLYMER
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|
|
|
|
Patent #:
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|
Issue Dt:
|
04/28/1992
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Application #:
|
07561798
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Filing Dt:
|
08/02/1990
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Title:
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POSITIVE-WORKING PHOTORESIST COMPOSITION CONTAINING PURIFIED BROADBAND DYE AND PROCESS OF USING
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Patent #:
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Issue Dt:
|
03/10/1992
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Application #:
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07564665
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Filing Dt:
|
08/07/1990
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Title:
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METHOD OF DEVELOPING A HIGH CONTRAST, POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING A ALKANOLAMINE
|
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|
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Patent #:
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|
Issue Dt:
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06/30/1992
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Application #:
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07587320
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Filing Dt:
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09/21/1990
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Title:
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HIGH CONTRAST, POSITIVE PHOTORESIST DEVELOPER CONTAINING ALKANOLAMINE
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Patent #:
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|
Issue Dt:
|
07/14/1992
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Application #:
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07614636
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Filing Dt:
|
11/16/1990
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Title:
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MIXED ALDEHYDE NOVOLAK RESINS USEFUL AS HIGH CONTRAST THERMAL STABILITY POSITIVE PHOTORESISTS
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Patent #:
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|
Issue Dt:
|
04/05/1994
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Application #:
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07619154
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Filing Dt:
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11/28/1990
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|
Title:
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PROCESS OF MAKING NAPHTHOQUINONE DIAZIDE ESTERS USING LACTONE SOLVENTS
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Patent #:
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Issue Dt:
|
11/09/1993
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Application #:
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07628549
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Filing Dt:
|
12/17/1990
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Title:
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PHOTOSENSITIZER COMPOSITIONS CONTAINING DIAZO FLUORINATED ESTERS OF HEXAFLUORO-BIS-PHENOLS OR BIS-HEXAFLUOROETHERS
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|
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Patent #:
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|
Issue Dt:
|
07/14/1992
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Application #:
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07645332
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Filing Dt:
|
01/04/1991
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Title:
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BIS-N,N' NITRO OR AMINO BENZOYL AMINO PHENOLS
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Patent #:
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|
Issue Dt:
|
08/31/1993
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Application #:
|
07667761
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Filing Dt:
|
03/11/1991
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|
Title:
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POLYAMIDE CONTAINING THE HEXAFLUOROISOPROPYLIDENE GROUP AND PROCESS OF USING TO FORM A POSITIVE IMAGE
|
|
|
|
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Patent #:
|
|
Issue Dt:
|
10/31/1995
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Application #:
|
07673243
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Filing Dt:
|
03/19/1991
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|
Title:
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PREPARATION AND USE OF POLY(3,5-DISUBSTITUTED 4-HYDROXYSTYRENE/ N-SUBSTITUTED MALEIMIDE
|
|
|
|
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Patent #:
|
|
Issue Dt:
|
01/26/1993
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Application #:
|
07693513
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Filing Dt:
|
04/30/1991
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|
Title:
|
DEEP U.V. PHOTORESIST COMPOSITIONS CONTAINING 4-TERT-BUTYLSTYRENE/ MALEIMIDE COPOLYMER AND CYCLOPENTANE -2-DIAZO-1,3-DIONE AND ELEMENTS UTILIZING THE COMPOSITIONS
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Patent #:
|
|
Issue Dt:
|
09/01/1992
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Application #:
|
07772976
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Filing Dt:
|
10/08/1991
|
|
Title:
|
POSITIVE PHOTORESIST COMPOSITIONS WITH O-QUINONE DIAZIDE, NOVOLAK AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/06/1993
|
Application #:
|
07782699
|
Filing Dt:
|
10/25/1991
|
|
Title:
|
BLOCKED MONOMER AND POLYMERS THEREFROM FOR USE AS PHOTORESISTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/26/1993
|
Application #:
|
07815645
|
Filing Dt:
|
12/30/1991
|
|
Title:
|
IMAGE REVERSAL NEGATIVE WORKING O-NAPHTHOQUINONE DIAZIDE AND CROSS- LINKING COMPOUND CONTAINING PHOTORESIST PROCESS WITH THERMAL CURING
|
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|
|
|
Patent #:
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Issue Dt:
|
06/22/1993
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Application #:
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07847527
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Filing Dt:
|
03/06/1992
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Title:
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DIAZO ESTER OF A BENZOLACTONE RING COMPOUND AND POSITIVE PHOTORESIST COMPOSITION AND ELEMENT UTILIZING THE DIAZO ESTER
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Patent #:
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Issue Dt:
|
08/30/1994
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Application #:
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07882207
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Filing Dt:
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05/13/1992
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Title:
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DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY
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Patent #:
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Issue Dt:
|
05/04/1993
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Application #:
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07886976
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Filing Dt:
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05/21/1992
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Title:
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HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS HAVING NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT
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Patent #:
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Issue Dt:
|
12/06/1994
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Application #:
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07953031
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Filing Dt:
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09/28/1992
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Title:
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NOVOLAK RESIN MIXTURES
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Patent #:
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Issue Dt:
|
03/21/1995
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Application #:
|
07978099
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Filing Dt:
|
11/19/1992
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Title:
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IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST CONTAINING O-QUINONE DIAZIDE AND CROSS-LINKING COMPOUND
|
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|
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Patent #:
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Issue Dt:
|
12/20/1994
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Application #:
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07996924
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Filing Dt:
|
12/29/1992
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Title:
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NOVOLAK RESIN BLENDS FOR PHOTORESIST APPLICATIONS
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Patent #:
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Issue Dt:
|
02/15/1994
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Application #:
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07996925
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Filing Dt:
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12/29/1992
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Title:
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PROCESS FOR PRODUCING A DEVELOPER HAVING A LOW METAL ION LEVEL
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Patent #:
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Issue Dt:
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03/25/1997
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Application #:
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07997942
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Filing Dt:
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12/29/1992
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Title:
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USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
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Patent #:
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Issue Dt:
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12/19/1995
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Application #:
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07999500
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Filing Dt:
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12/29/1992
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Title:
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METAL ION REDUCTION IN THE RAW MATERIALS AND USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESIN TO BE USED IN POSITIVE PHOTORESISTS
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Patent #:
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Issue Dt:
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06/20/1995
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Application #:
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08033076
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Filing Dt:
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03/10/1993
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Title:
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COMPOSITION AND METHOD FOR REMOVING PHOTORESIST COMPOSITION FROM SUBSTRATES SURFACES
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Patent #:
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Issue Dt:
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09/20/1994
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Application #:
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08042362
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Filing Dt:
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04/02/1993
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Title:
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METHOD FOR PRODUCING POSITIVE PHOTORESIST IMAGE UTILIZING DIAZO ESTER OF BENZOLACTONE RING COMPOUND AND DIAZO SULFONYL CHLORIDE
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Patent #:
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Issue Dt:
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10/15/1996
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Application #:
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08156182
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Filing Dt:
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11/22/1993
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Title:
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SEPARATING METALS USING A MODIFIED DEIONIZING RESIN
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Patent #:
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Issue Dt:
|
03/07/1995
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Application #:
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08239096
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Filing Dt:
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05/06/1994
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Title:
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PROCESS OF MAKING A STABLE SOLUTION OF POLY(HYDROXYSTYRENE) FUNCTIONALIZED WITH T-BUTYLOXYCARBONYL GROUPS
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Patent #:
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Issue Dt:
|
05/14/1996
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Application #:
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08258898
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Filing Dt:
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06/10/1994
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Title:
|
METAL ION REDUCTION IN TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS
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Patent #:
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Issue Dt:
|
08/06/1996
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Application #:
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08261646
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Filing Dt:
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06/17/1994
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Title:
|
PHOTORESIST HAVING A LOW LEVEL OF METAL IONS
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Patent #:
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Issue Dt:
|
01/14/1997
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Application #:
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08272962
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Filing Dt:
|
07/11/1994
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Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS AND PHOTORESISTS
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|
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Patent #:
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Issue Dt:
|
11/11/1997
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Application #:
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08294453
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Filing Dt:
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08/23/1994
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Title:
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METAL ION REDUCTION IN NOVOLAK RESIN SOLUTION USING AN ANION EXCHANGE RESIN
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Patent #:
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Issue Dt:
|
04/23/1996
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Application #:
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08353000
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Filing Dt:
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12/09/1994
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Title:
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NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS
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Patent #:
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Issue Dt:
|
05/28/1996
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Application #:
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08365659
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Filing Dt:
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12/30/1994
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Title:
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METAL ION REDUCTION IN NOVOLAK RESIN USING AN ION EXCHANGE CATALYST IN A POLAR SOLVENT AND PHOTORESISTS COMPOSITIONS THEREFROM
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Patent #:
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Issue Dt:
|
03/25/1997
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Application #:
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08366614
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Filing Dt:
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12/30/1994
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Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS SOLUTION IN PGMEA BY CHELATING ION EXCHANGE RESIN
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|
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Patent #:
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|
Issue Dt:
|
05/12/1998
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Application #:
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08366634
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Filing Dt:
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12/30/1994
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Title:
|
ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB SURFACE FORCED STEAM DISTILLATION
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Patent #:
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|
Issue Dt:
|
11/17/1998
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Application #:
|
08366635
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Filing Dt:
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12/30/1994
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Title:
|
QUINONE DIAZIDE COMPOSITIONS CONTAINING LOW METALS P-CRESOL OLIGOMERS AND PROCESS OF PRODUCING THE COMPOSITION
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Patent #:
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|
Issue Dt:
|
03/18/1997
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Application #:
|
08385857
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Filing Dt:
|
02/09/1995
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Title:
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POSITIVE PHOTORESIST COMPOSITION COMPRISING A MIXED ESTER OF TRIS- HYDROXYPHENYL ETHANE AND A MIXED ESTER OF TRIHYDROXYBENZOPHENONE
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Patent #:
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Issue Dt:
|
06/10/1997
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Application #:
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08416234
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Filing Dt:
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04/04/1995
|
|
Title:
|
METHOD FOR REMOVING PHOTORESIST COMPOSITION FROM SUBSTRATE SURFACES
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Patent #:
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|
Issue Dt:
|
12/03/1996
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Application #:
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08458588
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Filing Dt:
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06/02/1995
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|
Title:
|
METAL ION REDUCTION IN NOVOLAK RESINS AND PHOTORESISTS
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Patent #:
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|
Issue Dt:
|
04/29/1997
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Application #:
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08460392
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Filing Dt:
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06/02/1995
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Title:
|
METAL ION REDUCTION IN TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISIS
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Patent #:
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Issue Dt:
|
12/03/1996
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Application #:
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08460611
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Filing Dt:
|
06/02/1995
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Title:
|
METAL ION REDUCTION IN BOTTOM ANTI-REFLECTIVE COATINGS FOR USE IN SEMICONDUCTOR DEVICE FORMATION
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Patent #:
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Issue Dt:
|
01/14/1997
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Application #:
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08487944
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Filing Dt:
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06/07/1995
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Title:
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PREPARATION AND USE OF POLY (3,5 DISUBSTITUTED-4- HYDROXYSTYRENE /N-SUBSTITUTED MALEIMIDE)
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Patent #:
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Issue Dt:
|
12/02/1997
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Application #:
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08530648
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Filing Dt:
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09/20/1995
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Title:
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FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
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Patent #:
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Issue Dt:
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04/14/1998
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Application #:
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08530847
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Filing Dt:
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09/20/1995
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Title:
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FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
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Patent #:
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Issue Dt:
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05/12/1998
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Application #:
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08533828
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Filing Dt:
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09/26/1995
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Title:
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PROCESS FOR PRODUCING SURFACTANT HAVING A LOW METAL ION LEVEL AND DEVELOPER PRODUCED THEREFROM
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Patent #:
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Issue Dt:
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11/03/1998
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Application #:
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08537199
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Filing Dt:
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09/29/1995
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Title:
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LOW METALS PERFLUOROOCTANOIC ACID AND TOP ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS
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Patent #:
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Issue Dt:
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10/05/1999
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Application #:
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08562867
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Filing Dt:
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11/27/1995
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Title:
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METAL ION REDUCTION IN PHOTORESIST COMPOSITIONS BY CHELATING ION EXCHANGE RESIN
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Patent #:
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Issue Dt:
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12/29/1998
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Application #:
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08576748
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Filing Dt:
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12/21/1995
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Title:
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POSITIVE PHOTORESIST UTILIZING MIXED SOLVENT CONSISTIING ESSENTIALLY OF 3-METHYL-3-METHOXY BUTANOL AND PROPYLENE GLYCOL ALKYL ETHER ACETATE
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Patent #:
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Issue Dt:
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07/08/1997
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Application #:
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08692306
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Filing Dt:
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08/05/1996
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Title:
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NOVOLAK RESIN BLENDS FOR PHOTORESIST APPLICATIONS
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Patent #:
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Issue Dt:
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02/17/1998
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Application #:
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08695157
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Filing Dt:
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08/07/1996
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Title:
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POSITIVE PHOTORESIST COMPOSITION CONTAINING A 2,4-DINITRO-1-NAPHTHOL
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Patent #:
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Issue Dt:
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06/09/1998
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Application #:
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08722711
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Filing Dt:
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09/30/1996
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Title:
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LIGHT SENSITIVE COMPOSITION CONTAINING AN ARYLHYDRAZO DYE
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Patent #:
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Issue Dt:
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03/31/1998
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Application #:
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08724109
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Filing Dt:
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09/30/1996
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Title:
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ANTIREFLECTIVE COATING FOR PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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12/29/1998
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Application #:
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08768539
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Filing Dt:
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12/18/1996
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Title:
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FRACTIONATED NOVOLAK RESIN AND PHOTORESIST COMPOSITION THEREFROM
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Patent #:
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Issue Dt:
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06/08/1999
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Application #:
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08768541
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Filing Dt:
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12/18/1996
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Title:
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FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM
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Patent #:
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Issue Dt:
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11/18/1997
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Application #:
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08771715
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Filing Dt:
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12/20/1996
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Title:
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METHOD OF USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
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Patent #:
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Issue Dt:
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07/13/1999
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Application #:
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08802807
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Filing Dt:
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02/18/1997
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Title:
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PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE
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Patent #:
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Issue Dt:
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03/28/2000
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Application #:
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08811806
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Filing Dt:
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03/06/1997
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Title:
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BOTTOM ANTIREFLECTIVE COATINGS THROUGH REFRACTIVE INDEX MODIFICATION BY ANOMALOUS DISPERSION
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|
