Patent Assignment Details
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| Reel/Frame: | 016917/0261 | |
| Pages: | 4 |
| | Recorded: | 08/03/2005 | | |
| Attorney Dkt #: | 263788US2PCT |
| Conveyance: | CORRECTIVE ASSIGNMENT PREVIOUSLY RECORDED AT REEL 016251 FRAME 0800, TO CORRECT THE ASSIGNEES ADDRESS. THE CONVEYING PARTIES HEREBY CONFIRM THE ASSIGNMENT OF THE ENTIRE INTEREST. |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10519475
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Filing Dt:
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12/28/2004
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Publication #:
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Pub Dt:
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10/13/2005
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Title:
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Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process
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Assignee
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| 16-5, KONAN 2-CHOME, MINATO-KU |
| TOKYO 108-8215, JAPAN |
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Correspondence name and address
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OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST
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1940 DUKE STREET
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ALEXANDRIA, VA 22314
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