Patent Assignment Details
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| Reel/Frame: | 017245/0295 | |
| Pages: | 3 |
| | Recorded: | 03/02/2006 | | |
| Attorney Dkt #: | 2522-154 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11331305
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Filing Dt:
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01/11/2006
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Publication #:
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Pub Dt:
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07/13/2006
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Title:
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Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist composition
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Assignee
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| 416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI |
| GYEONGGI-DO, KOREA, REPUBLIC OF |
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Correspondence name and address
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HOSOON LEE
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210 SW MORRISON STREET, SUITE 400
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PORTLAND, OR 97204
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